Inventor

WALKER MICHAEL A

US102 patents

⚠️ This page may combine multiple inventors who share the name “WALKER MICHAEL A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WALKER MICHAEL A

MICRON TECHNOLOGY INC

Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates

Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates

Web-format planarizing machines and methods for planarizing microelectronic substrate assemblies

Method and apparatus for releasably attaching polishing pads to planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates

Web-format planarizing machines and methods for planarizing microelectronic substrate assemblies

Polishing polymer surfaces on non-porous CMP pads

Semiconductor processing methods of forming stacked capacitors

Chemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing pads

Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers

Fixed abrasive polishing pad

Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers

Method and apparatus for stopping mechanical and chemical-mechanical planarization of substrates at desired endpoints

Directional spray pad scrubber

Polishing pad and method of use

Spiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafers

Semiconductor processing methods of forming stacked capacitors

Directional spray pad scrubber

Semiconductor processing methods of forming stacked capacitors

Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing

Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing

CMP polishing pad with hydrophilic surfaces for enhanced wetting

Method and apparatus for stopping mechanical and chemical mechanical planarization of substrates at desired endpoints

Polishing pad, methods of manufacturing and use

Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication

Permeable capacitor electrode

Fixed abrasive polishing pad

Polishing pad methods of manufacture and use

Fixed abrasive polishing pad

Fixed abrasive polishing pad

Polishing pad and system

Surface cleaning apparatus and method

Methods of polishing materials, methods of slowing a rate of material removal of a polishing process

Wet clean for a surface having an exposed silicon/silica interface

Method of making cup-shaped DRAM capacitor having an inwardly overhanging lip

Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication

Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication

Method of making sacrificial self-aligned interconnection structure

Web-format planarizing machines and methods for planarizing microelectronic substrate assemblies

Surface cleaning apparatus

Treatment of a surface having exposed silica

Method of forming recessed container cells by wet etching conductive layer and dissimilar layer formed over conductive layer

Permeable capacitor electrode

Permeable capacitor electrode

BRISTOL MYERS SQUIBB CO

Bicyclic heterocycles as HIV integrase inhibitors

Bicyclic heterocycles as HIV integrase inhibitors

Bicyclic heterocycles as HIV integrase inhibitors

HIV integrase inhibitors

MICRON TECHNOLOGIES INC

Semiconductor processing methods of forming stacked capacitors

BOEING CO

Resin transfer molding of composite materials that emit volatiles during processing