Inventor
NISHI KENJI
JP147 patents
⚠️ This page may combine multiple inventors who share the name “NISHI KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
48 patentsUS7256869B2Aug 14, 2007
Exposure apparatus and an exposure method
NIKON CORP103 citations99
US7177008B2Feb 13, 2007
Exposure apparatus and method
NIKON CORP135 citations99
US6798491B2Sep 28, 2004
Exposure apparatus and an exposure method
NIKON CORP103 citations99
US6608681B2Aug 19, 2003
Exposure method and apparatus
NIKON CORP171 citations99
US6590634B1Jul 8, 2003
Exposure apparatus and method
NIKON CORP843 citations99
US6549269B1Apr 15, 2003
Exposure apparatus and an exposure method
NIKON CORP601 citations99
US6498352B1Dec 24, 2002
Method of exposing and apparatus therefor
NIKON CORP92 citations99
US6433872B1Aug 13, 2002
Exposure method and apparatus
NIKON CORP99 citations99
US6400441B1Jun 4, 2002
Projection exposure apparatus and method
NIKON CORP707 citations99
US6341007B1Jan 22, 2002
Exposure apparatus and method
NIKON CORP1,005 citations99
US6331885B1Dec 18, 2001
Stage apparatus, scanning type exposure apparatus, and device produced with the same
NIKON CORP164 citations99
US6279881B1Aug 28, 2001
Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object
NIKON CORP90 citations99
US6051843AApr 18, 2000
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement
NIKON CORP124 citations99
US5883704AMar 16, 1999
Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
NIKON CORP183 citations99
US5844247ADec 1, 1998
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement
NIKON CORP99 citations99
US5693439ADec 2, 1997
Exposure method and apparatus
NIKON CORP117 citations99
US5646413AJul 8, 1997
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement
NIKON CORP504 citations99
US5591958AJan 7, 1997
Scanning exposure method and apparatus
NIKON CORP194 citations99
US5493403AFeb 20, 1996
Method and apparatus for the alignment of a substrate
NIKON CORP285 citations99
US5477304ADec 19, 1995
Projection exposure apparatus
NIKON CORP227 citations99
US5473410ADec 5, 1995
Projection exposure apparatus
NIKON CORP200 citations99
US5448332ASep 5, 1995
Exposure method and apparatus
NIKON CORP705 citations99
US5243195ASep 7, 1993
Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
NIKON CORP821 citations99
US5194893AMar 16, 1993
Exposure method and projection exposure apparatus
NIKON CORP302 citations99
US6906782B2Jun 14, 2005
Stage apparatus, scanning type exposure apparatus, and device produced with the same
NIKON CORP79 citations98
US6853443B2Feb 8, 2005
Exposure apparatus, substrate processing system, and device manufacturing method
NIKON CORP98 citations98
US6765647B1Jul 20, 2004
Exposure method and device
NIKON CORP72 citations98
US6590636B2Jul 8, 2003
Projection exposure method and apparatus
NIKON CORP78 citations98
US6522386B1Feb 18, 2003
Exposure apparatus having projection optical system with aberration correction element
NIKON CORP93 citations98
US6597430B1Jul 22, 2003
Exposure method, illuminating device, and exposure system
NIKON CORP92 citations97
US6590633B1Jul 8, 2003
Stage apparatus and method for producing circuit device utilizing the same
NIKON CORP99 citations97
US6400445B2Jun 4, 2002
Method and apparatus for positioning substrate
NIKON CORP87 citations97
US6813000B1Nov 2, 2004
Exposure method and apparatus
NIKON CORP60 citations96
US6563565B2May 13, 2003
Apparatus and method for projection exposure
NIKON CORP56 citations96
US6545746B1Apr 8, 2003
Projection exposure apparatus
NIKON CORP59 citations96
US6486955B1Nov 26, 2002
Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
NIKON CORP57 citations96
US6327022B1Dec 4, 2001
Projection exposure method and apparatus
NIKON CORP67 citations96
US6225012B1May 1, 2001
Method for positioning substrate
NIKON CORP57 citations96
US6002467ADec 14, 1999
Exposure apparatus and method
NIKON CORP58 citations96
US5995234ANov 30, 1999
Method and apparatus for the alignment of a substrate
NIKON CORP51 citations96
US5995263ANov 30, 1999
Projection exposure apparatus
NIKON CORP39 citations96
US5994006ANov 30, 1999
Projection exposure methods
NIKON CORP37 citations96
US5991009ANov 23, 1999
Illumination optical apparatus using different number of light sources under different exposure modes, method of operating and method of manufacturing thereof
NIKON CORP48 citations96
US5892572AApr 6, 1999
Projection exposure apparatus and method
NIKON CORP77 citations96
US5854671ADec 29, 1998
Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
NIKON CORP72 citations96
US5815248ASep 29, 1998
Illumination optical apparatus and method having a wavefront splitter and an optical integrator
NIKON CORP44 citations96
US5739899AApr 14, 1998
Projection exposure apparatus correcting tilt of telecentricity
NIKON CORP92 citations96
US5734478AMar 31, 1998
Projection exposure apparatus
NIKON CORP55 citations96
NISHI KENJI
1 patentNIPPON KOGAKU KK
1 patentShowing the top 50 of 147 patents by PatentIndex Score.