Projection exposure apparatus having an off-axis alignment system and method of alignment therefor

Abstract

An exposure apparatus for exposing mask patterns on a sensitive plate comprises a set (for X and Y direction) of a laser interferometer for measuring a position of a wafer stage and satisfying Abbe's condition with respect to a projection lens and a set (for X and Y direction) of the laser interferometer and satisfying Abbe's condition with respect to off-axis alignment system. When a fiducial mark on the wafer stage is positioned directly under the projection lens, a presetting is performed so that measuring values by the two sets of laser interferometers are equal to each other.

What is claimed is: 
     
       1. An exposure apparatus for exposing mask patterns on a sensitive plate having, a mask stage holding said mask,   a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate,   a projection optical system imaging said mask patterns at a predetermined position on said sensitive plate,   a first mark detecting system for detecting a mask mark formed at a predetermined position on said mask in the image field of said projection optical system, and   a second mark detecting system for detecting a plate mark formed on said sensitive plate in a detection area positioned at predetermined intervals from the optical axis of said projection optical system,   said exposure apparatus comprising: (a) a first fiducial mark member arranged on a part of said plate stage, having a shape capable of being detected by said first mark detecting system through said projection optical system;   (b) a second fiducial mark member arranged on a part of said plate stage, having a shape capable of being detected by said second mark detecting system; and   (c) a mounting member for mounting said first fiducial mark member and said second fiducial mark member at constant intervals recognized in advance so as to position said second fiducial mark member in the detection area of said second mark detecting system when said first fiducial mark member is positioned in a predetermined relationship with respect to the position where said mask mark is to be present in the image field of said projection optical system.     
     
     
       2. An exposure apparatus for exposing mask patterns on a sensitive plate having, a mask stage holding said mask,   a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate,   a projection optical system imaging said mask patterns at a predetermined position on said sensitive plate,   a first mark detecting system for detecting a mask mark formed at a predetermined position on said mask in the image field of said projection optical system, and   a second mark detecting system having a detection center positioned at predetermined intervals apart from the optical axis of said projection optical system, for detecting a plate mark formed on said sensitive plate,   said exposure apparatus comprising: (a) a first fiducial mark member arranged on a part of said plate stage and capable of being detected by said first mark detecting system through said projection optical system;   (b) a second fiducial mark member arranged on a part of said plate stage, and capable or being detected by said second mark detecting system;   (c) a mounting member for mounting said first fiducial mark member and said second fiducial mark member at constant intervals recognized in advance so as to position said second fiducial mark member in the detection area of said second mark detecting system when said first fiducial mark member is positioned in a predetermined relationship with respect to the position where said mask mark is to be present in the image field of said projection optical system; and   (d) base line determining means for calculating the base line distance between the projecting position of said mask patterns by said projection optical system and the position of the detection center of said second mark detecting system based on the positional displacement value between said first fiducial mark member and said mask mark detected by said first mark detecting system, the positional displacement value of said second fiducial mark member against said detection center detected by said second mark detecting system, and the value of said constant intervals recognized in advance.     
     
     
       3. An exposure apparatus for exposing mask patterns on a sensitive plate having a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate, a projection optical system imaging said mask patterns at a predetermined position on said sensitive plate, a first mark detecting system for detecting a mask mark formed at a predetermined position on said mask in the image field of said projection optical system, and a second mark detecting system, having a detection area positioned at predetermined intervals apart from the optical axis of said projection optical system, for detecting a plate mark formed on said sensitive plate, said exposure apparatus comprising: (a) a first fiducial mark member arranged on a part of said plate stage and capable of being detected by said first mark detecting system through said projection optical system;   (b) a second fiducial mark member arranged on a part of said plate stage, and capable of being detected by said second mark detecting system;   (c) a mounting member for mounting said first fiducial mark member and said second fiducial mark member at constant intervals recognized in advance so as to position said second fiducial mark member in the detection area of said second mark detecting system when said first fiducial mark member is positioned in a predetermined relationship with respect to the position where said mask mark is to be present in the image field of said projection optical system;   (d) positioning control means for causing said plate stage to be stationary on said rectangular coordinate system so as to enable said mask mark and said first fiducial mark member to be detected in an aligned state by said first mark detecting system;   (e) means for starting the detecting operation of said second mark detecting system for said second fiducial mark member while said positioning control means is activating; and   (f) base line determining means for calculating the base line distance between the projecting position of said mask patterns by said projection optical system and the position of the detection area of said second mark detecting system based on the positional displacement value of said second fiducial mark member detected by said second mark detecting system, and the value of said constant intervals recognized in advance.   
     
     
       4. An exposure apparatus for exposing mask patterns on a sensitive plate having a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate, a projection optical system imaging said mask patterns at a predetermined position on said sensitive plate, a first mark detecting system for detecting a mask mark formed at a predetermined position on said mask in the image field of said projection optical system, and a second mark detecting system, having a detection area positioned at predetermined intervals apart from the optical axis of said projection optical system, for detecting a plate mark formed on said sensitive plate, said exposure apparatus comprising: (a) a first fiducial mark member arranged on a part of said plate stage and capable of being detected by said first mark detecting system through said projection optical system;   (b) a second fiducial mark member arranged on a part of said plate stage, and capable of being detected by said second mark detecting system;   (c) a mounting member for mounting said first fiducial mark member and said second fiducial mark member at constant intervals recognized in advance so as to position said second fiducial mark member in the detection area of said second mark detecting system when said first fiducial mark member is positioned in a predetermined relationship with respect to the position where said mask mark is to be present in the image field of said projection optical system;   (d) positioning control means for causing said plate stage to be stationary on said rectangular coordinate system so as to enable said detection area and said first fiducial mark member to be detected in an aligned state by said second mark detecting system;   (e) means for starting the detecting operation of said mask mark and said second fiducial mark member by said first mark detecting system while said positioning control means is activating; and   (f) base line determining means for calculating the base line distance between the projecting position of said mask patterns by said projection optical system and the position of the detection area of said second mark detecting system based on the positional displacement value between said mask mark and said second fiducial mark member detected by said first mark detecting system, and the value of said constant intervals recognized in advance.   
     
     
       5. An exposure apparatus for exposing mask patterns on a sensitive plate including a projection optical system imaging said mask patterns at a predetermined image plane position on said sensitive plate, a plate stage movable two dimensionally in accordance with a rectangular coordinate system parallel to said image plane while holding said sensitive plate, a first mark detecting system for detecting a mark on said sensitive plate through a first detecting area provided in the projection image field of said projection optical system, a second mark detecting system for detecting a mark on said sensitive plate through a second detecting area provided outside the projection image field of said projection optical system, said exposure apparatus comprising: (a) a fiducial member mounted on a part of said plate stage with a first fiducial mark capable of being detected by said first mark detecting system and a second fiducial mark capable of being detected by said second mark detecting system, said first and second fiducial marks being formed at predetermined constant intervals, wherein said first and second fiducial marks are provided in a positional relationship substantially the same as the arrangement of said first and second detecting areas in said rectangular coordinate system;   (b) a first measuring means of an incremental type having measuring axes arranged in parallel with each of the two coordinate axes of said rectangular coordinate system to satisfy the Abbe's condition with respect to the optical axis of said projection optical system for measuring the coordinate positions on said rectangular coordinate system of said plate stage;   (c) a second measuring means of an incremental type having measuring axes arranged in parallel with each of the two coordinate axes of said rectangular coordinate system to satisfy the Abbe's condition with respect to the second detecting area of said second mark detecting system for measuring the coordinate positions on said rectangular coordinate system of said plate stage; and   (d) resetting means for resetting each of the measured values of said first and second measuring means to a same value when said plate stage is positioned so that said first fiducial mark is detected by said first mark detecting system and at the same time, said second fiducial mark is detected by said second mark detecting system.   
     
     
       6. An exposure apparatus for exposing mask patterns on a sensitive plate including a projection optical system imaging said mask patterns at a predetermined image plane position of said sensitive plate, a plate stage movable two dimensionally in accordance with a rectangular coordinate system parallel to said image plane while holding said sensitive plate, a first mark detecting system for detecting a mask mark on said mask through a detecting area provided in the projection image field of said projection optical system, a second mark detecting system for detecting a mark on said sensitive plate through a detecting area provided outside the projection image field of said projection optical system, said exposure apparatus comprising: (a) a fiducial member provided on a part of said plate stage and having a fiducial mark detecting by said first mark detecting system;   (b) positioning control means for driving said plate state and for causing said plate stage to be stationary in order to arrange said fiducial mark at a predetermined position in the image field of said projection optical system for enabling said first mark detecting system to detect both said mask mark and said fiducial mark;   (c) a first measuring means of an incremental type having measuring axes arranged in parallel with each of the two coordinate axes of said rectangular coordinate system to satisfy the Abbe's condition with respect to the optical axis of said projection optical system for measuring the coordinate positions on said rectangular coordinate system of said plate stage;   (d) a second measuring means of an incremental type having measuring axes arranged in parallel with each of the two coordinate axes of said rectangular coordinate system to satisfy the Abbe's condition with respect to the detection area of said second mark detecting system for measuring the coordinate positions on said rectangular coordinate system of said plate stage; and   (e) resetting means for resetting each of the measured values of said first and second measuring means to a same value when said plate stage is positioned by said positioning control means.   
     
     
       7. An exposure apparatus for exposing mask patterns on a sensitive plate including a mask stage movable two dimensionally while holding said mask, a projection optical system for imaging said mask patterns on said sensitive plate, a plate stage movable two dimensionally in a rectangular coordinate system while holding said sensitive plate, and a first mark detecting system for detecting mask marks formed at a plurality of positions on said mask in the projection image field of said projection optical system, said exposure apparatus comprising: (a) a fiducial member provided on a part of said plate stage with a first fiducial marks being formed to be aligned with each of said mask marks through the projection image field of said projection optical system;   (b) means for storing values of mounting errors of said fiducial member on said plate stage in advance with said rectangular coordinate system as reference;   (c) a first control means for driving said plate stage and for causing said plate stage to be stationary so as to arrange said plurality of fiducial marks at predetermined positions in the projection image field of said projection optical system; and   (d) a second control means for positioning said mask stage on the basis of the detection of said first mark detecting system so that said mask marks are displaced by said mounting errors to be aligned with respect to said plurality of fiducial marks at said predetermined positions.   
     
     
       8. An exposure apparatus for exposing mask patterns on a sensitive plate having a mark stage holding said mask, a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate, a projection optical system for imaging said mask patterns on said sensitive plate, an inner-field alignment system for detecting the patterns formed on an object on said plate stage through the image field of said projection optical system, and an outer-field alignment system for detecting the patterns of said object, said exposure apparatus comprising: (a) a fiducial member of a low expansion material mounted on a part of said plate stage with a first fiducial mark capable of being detected by said inner-field alignment system and a second fiducial mark capable of being detected by said outer-field alignment system being formed on the surface thereof, wherein said first and second fiducial marks are provided in a positional relationship substantially the same as the arrangement the mark detecting areas of said inner-field alignment system and said outer-field alignment system in said rectangular coordinate system;   (b) positioning control means of positioning said plate stage to cause said first fiducial mark to be stationary at a predetermined position in the image field of said projection optical system; and   (c) means for instructing said inner-field alignment system and said outer-field alignment system to detect respectively said first fiducial mark and said second fiducial mark almost simultaneously with said plate stage being at rest.   
     
     
       9. A method for controlling the precision of an exposure apparatus for exposing mask patterns on a sensitive plate provided with a mask stage holding said mask, a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate, an alignment system for detecting at least one of a mask mark formed on said mask and a plate mark formed on said sensitive plate for the alignment of said mask and said sensitive plate, and a fiducial member arranged on a part of said plate stage with a fiducial mark formed thereon to be detected by said alignment system, including the following steps of: (a) aligning said mask with respect to said fiducial member by arranging the fiducial mark of said fiducial member at an exposing position in said rectangular coordinate system and detecting said mask mark and fiducial mark using said alignment system;   (b) sequentially exposing said mask patterns on said sensitive plate for each of step positions by moving said plate stage in the direction of one of the coordinate axes of said rectangular coordinate system step by step for a predetermined amount, wherein said mask patterns are partially overlapped in the direction of the step movement for exposure;   (c) measuring a positional deviating amount of said overlapped portions of the patterns exposed on said sensitive plate in a direction intersecting at right angles with said direction of the step movement; and   (d) calculating the mounting error of said fiducial member on said plate stage with said rectangular coordinate system as reference on the basis of said measured positional deviating amount.   
     
     
       10. An exposure apparatus for exposing mask patterns on a sensitive plate including: a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate,   a projection optical system for imaging said mask patterns on said sensitive plate,   a light emission mark member mounted on a part of said plate stage for forming a fine light emission mark image on said mask through said projection optical system,   a first detecting system for detecting variation of the light being generated when said light emission mark image scans a mark formed on said mask, and   a second detecting system for detecting a mark on said sensitive plate by scanning said plate stage through a detecting area arranged outside the image field of said projection optical system, comprising the following: (a) a fiducial member mounted on a part of said plate stage at a predetermined interval with respect to said light emission mark member with a fiducial mark formed thereon to be detected by said second detecting system, where the light emission mark of said light emission mark member and the fiducial mark of said fiducial member are provided in a positional relationship substantially the same as the arrangement of the expected position of the projection of the mark of said mask by said projection of the mark of said mask by said projection optical system and the position of the detecting area of said second detecting system in said rectangular coordinate system;   (b) driving control means for scanning said plate stage in a predetermined direction so as to cause said fiducial mark to pass through the detecting area of said second detecting system while said light emission image by said projection optical system scans only a predetermined area including said mask mark; and   (c) means for storing signals output from each of the first detecting system and said second detecting system while said plate stage is scanned.     
     
     
       11. An exposure apparatus for exposing mask patterns on a sensitive plate including: a plate stage movable two dimensionally in accordance with a rectangular coordinate system while holding said sensitive plate, p1 a projection optical system for imaging said mask patterns on said sensitive plate,   a first detecting system mounted on a part of said plate stage for detecting photoelectrically mark imaging light from said mask projected by said projection optical system through a light receiving area, and   a second detecting system for detecting a mark on said sensitive plate photoelectrically through a detecting area arranged outside the image field of said projection optical system, comprising the following: (a) a fiducial member mounted on a part of said plate stage at predetermined interval with respect to said first detecting system with a fiducial mask formed thereon to be detected by said second detecting system, wherein the light receiving area of said first detecting system and the fiducial mark of said fiducial member are provided in a positional relationship substantially the same as the arrangement of the expected position of the image mark imaging light from said mask by said projection optical system and the position of the detection area of said second detecting system in said rectangular coordinate system; and   (b) driving control means for driving said plate stage to cause said fiducial mark to be detected by said second detecting system substantially at the same time that the mark imaging light from said mask by said projection optical system is detected by said first detecting system. .Iadd.     
     
     
       12.  An alignment apparatus, comprising: a movable stage for supporting an object having at least one mark and for moving in a predetermined coordinate system;   a mark detecting system having a detecting region located at a predetermined position in said coordinate system, for detecting the mark positioned into said detecting region and for producing a deviation value of said mark and a predetermined target point designated in said detecting region;   an interferometer system including a counter for producing a measuring value that is variable in response to the movement of said movable stage; and   a control system for determining control information so as to bring said movable stage into a predetermined position in said coordinate system, on the basis of the deviation value from said mark detecting system and a plurality of the measuring values read out from said counter at the same time as the detecting by said mark detecting system, and for controlling said movable stage on the basis of the determined control information..Iaddend..Iadd.   
     
     
       13.  Apparatus according to claim 12, wherein said mark detecting system includes an objective lens for forming an image of the mark of the object on a predetermined imaging plane, and an image pick-up device located at said imaging plane for generating a video signal, said detecting region being defined by an image receiving area of said image pick-up device..Iaddend..Iadd.14. Apparatus according to claim 13, wherein said predetermined target point is defined by a target mark of a target plate disposed in an optical path from said objective lens to said image pick-up device..Iaddend..Iadd.15. Apparatus according to claim 14, wherein said mark detecting system includes an image processing circuit for processing said video signal and for producing a deviation amount of said target mark and the mark of said object..Iaddend..Iadd.16. Apparatus according to claim 15, wherein said image processing circuit calculates a mean value of a plurality of the deviation amounts and generates said mean value as said deviation value..Iaddend..Iadd.17. A device manufacturing method to transfer a pattern image of a mask onto a predetermined region of a substrate in a predetermined aligning state, comprising the steps of: (a) detecting a first deviation value of the mask and a fiducial mark plate, said fiducial mark plate being mounted on a movable XY-stage supporting the substrate;   (b) detecting a second deviation value of said fiducial mark plate and a detection center of an alignment system provided for detecting alignment marks formed on the substrate;   (c) measuring positional information of the XY-stage by reading out a plurality of measured values produced from an interferometer system at the same time as the detecting of said second deviation value;   (d) determining a base line value having relation to a distance between a center of the mask and the detection center of said alignment system, on the basis of said first deviation value, said second deviation value and said positional information; and   (e) controlling the movement of said XY-stage so as to align the mask and the predetermined region of the substrate relatively, on the basis of the determined base line value..Iaddend..Iadd.18. A device manufacturing method to transfer a pattern image of a mask onto a predetermined region of a substrate in a predetermined aligning state, comprising the steps of:   (a) aligning a fiducial mark plate and the mask, said fiducial mark plate being mounted on a movable XY-stage on which the substrate is supported;   (b) detecting a deviation value of said fiducial mark plate and a detection center of an alignment system provided for detecting alignment marks formed on the substrate;   (c) measuring positional information of the XY-stage by reading out a plurality of measured values produced from an interferometer system at the same time as the detecting of said deviation value;   (d) determining a base line value having relation to a distance between a center of the mask and the detection center of said alignment system, on the basis of said deviation value and said positional information; and   (e) controlling the movement of said XY-stage so as to align the mask and the predetermined region of the substrate relatively, on the basis of the   
     
     
        determined base line value..Iaddend..Iadd.19.  An exposure apparatus which exposes a photosensitive substrate with an illumination beam irradiated on a mask through a projection optical system, comprising: a movable member disposed at an image plane side of said projection optical system for supporting said photosensitive substrate;   a mark detection system for detecting a first mark disposed on said movable member by projecting a light beam having substantially the same wavelength as said illumination beam and receiving a light beam reflected by said first mark through said projection optical system;   an alignment optical system for detecting an alignment mark on said photosensitive substrate and for detecting a second mark disposed on said moveable member, said alignment optical system having an optical axis which is different from an optical axis of said mark detection system; and   a fiducial plate disposed on said movable member for determining a base line of said alignment optical system, said fiducial plate including said first mark and said second mark, both of which are detected substantially simultaneously..Iaddend..Iadd.20. An apparatus according to claim 19, wherein said alignment optical system includes an objective optical system which is independent from said projection optical system and an image pick-up element for picking-up an image of said second mark through said objective optical system..Iaddend..Iadd.21. An apparatus according to claim 20, wherein said alignment optical system projects a wide-bandwidth light beam, of which a wavelength range is different from that of said illumination beam, onto said fiducial plate through said objective optical system..Iaddend..Iadd.22. A method of exposing a photosensitive substrate with an illumination beam irradiated on a mask through a projection optical system, comprising the steps of:   disposing a fiducial plate on which first and second marks are formed at an image plane side of said projection optical system;   projecting a light beam having substantially the same wavelength as said illumination beam toward said first mark to detect a light beam reflected by said first mark through said projection optical system; and   detecting said second mark by an off-axis alignment optical system substantially simultaneously to the detection of said first mark to determine a base line of said off-axis alignment optical system, which is disposed independently from said projection optical system..Iaddend..Iadd.23. A method according to claim 22, wherein said first mark provides a positional relationship with respect to a mark on said mask and said second mark provides a positional relationship with respect to an index mark in said alignment optical system..Iaddend..Iadd.24. A method according to claim 23, wherein the base line of said alignment optical system is determined based on the two positional relationships and positional information of a stage on which said fiducial plate is disposed..Iaddend..Iadd.25. An alignment apparatus, comprising:   an interferometer to produce information with respect to relative movement of a mask and a substrate;   an alignment optical system that outputs a signal corresponding to a relative deviation between a first mark on the mask and a second mark on the substrate; and   an alignment controller that determines a positional relationship between the mask and the substrate based on the signal from said alignment optical system and a plurality of values of information produced by said interferometer in response to a detection of the first and second marks by   
     
     
        said alignment optical system..Iaddend..Iadd.26.  An apparatus according to claim 25, wherein said alignment controller calculates an equalized value of said plurality of values of information to determine said positional relationship based on said signal and the equalized value..Iaddend..Iadd.27. An apparatus according to claim 25, further comprising: a projection optical system disposed between said mask and said substrate; and   an off-axis alignment optical system having an optical axis different from that of the projection optical system to detect a third mark formed on said substrate..Iaddend..Iadd.28. An alignment method comprising the steps of:   detecting a relative deviation between a first mark on a mask and a second mark on a substrate;   measuring a relative position between the mask and the substrate; and   determining a positional relationship between the mask and the substrate based on the detected relative deviation and a plurality of relative positions measured in response to a detection of the first and second   
     
     
        marks..Iaddend..Iadd.29.  A method according to claim 28, wherein said positional relationship is determined based on said detected relative deviation and an equalized value of said plurality of relative positions..Iaddend..Iadd.30. A method according to claim 28, wherein said relative position is measured by an interferometer which detects a position of said mask in an alignment direction..Iaddend..Iadd.31. A method according to claim 29, further comprising: obtaining positional information of a third mark on said substrate by an off-axis alignment optical system; and   determining a baseline of the off-axis alignment optical system based on the determined positional relationship and the obtained positional information..Iaddend..Iadd.32. A method according to claim 31, wherein the detection of the relative deviation between said first mark and said second mark and a detection of said third mark are performed substantially simultaneously..Iaddend..Iadd.33. An alignment method comprising the steps of:   detecting a relative deviation between a first mark on a mask and a second mark on a substrate;   measuring a relative position between the mask and the substrate; and   adjusting a positional relationship of the mask and the substrate based on the detected relative deviation and a plurality of relative positions measured in response to a detection of the first and second   
     
     
        marks..Iaddend..Iadd.34.  A projection exposure apparatus which exposes a substrate with a projected image of a mask through a projection optical system, comprising: a first mark detection system which has a detection area at the image side of said projection optical system to detect a mark on said substrate through an optical element different from the projection optical system;   a second mark detection system which detects a mark disposed at the image side of said projection optical system through the projection optical system; and   a movable member disposed at the image side of said projection optical system, on which a first mark and a second mark are arranged in such a positional relationship that allows the detection of said first mark by said first mark detection system and the detection of said second mark by said second mark detection system substantially simultaneously..Iaddend..Iadd.35. An apparatus according to claim 34, wherein a distance between said first and second marks is set such that said second mark falls within a detection area of said second mark detection system when the detection of said first mark by said first mark detection system is effected..Iaddend..Iadd.36. An apparatus according to claim 34, wherein a distance between said first and second marks is set such that the detection of the first mark by said first mark detection system and the detection of the second mark by said second mark detection system can be effected without movement of said movable member..Iaddend..Iadd.37. An apparatus according to claim 34, wherein a distance between said first and second marks is set substantially corresponding to a distance between a detection area of said first mark detection system and a detection area of said second mark detection system..Iaddend..Iadd.38. An apparatus according to claim 34, wherein said second mark detection system detects a mark on said mask as well as said second mark and a distance between said first and second marks is set substantially corresponding to a distance between a position of said mark on the mask detected by said second mark detection system within a projection field of said projection optical system and a center of detection of said first mark detection system..Iaddend..Iadd.39. An apparatus according to claim 34, further comprising:   an interferometer having at least one measurement axis which passes through a center of detection of said first mark detection system, wherein an output of said interferometer is used upon detection of said first mark by said first mark detection system..Iaddend..Iadd.40. An apparatus according to claim 34, wherein said movable member is a substrate stage which holds said substrate..Iaddend..Iadd.41. An apparatus according to claim 34, further comprising a mask stage which holds said mask, wherein said apparatus scanningly exposes said substrate with said projected image by moving said mask and said substrate in a direction perpendicular to an optical axis of said projection optical system..Iaddend..Iadd.42. An apparatus according to claim 34, further comprising a mask stage which holds said mask, wherein said apparatus transfers a pattern on said mask onto said substrate in accordance with a step and scan scheme..Iaddend..Iadd.43. An apparatus according to claim 34, further comprising:   a drive system which moves said movable member; and   a controller connected to said drive system, which servo-locks, upon detection of said second mark by said second mark detection system, said movable member based on an output of said first mark detection system..Iaddend..Iadd.44. An apparatus according to claim 43, wherein said controller servo-locks said movable member such that a center of detection of said first mark detection system and said first mark substantially coincide..Iaddend..Iadd.45. An apparatus according to claim 34, wherein said first and second marks are disposed on said movable member separately   
     
     
        at positions different from each other..Iaddend..Iadd.46.  An apparatus according to claim 45, wherein said first and second marks are formed on a single fiducial plate disposed on said movable member..Iaddend..Iadd.47. An apparatus according to claim 46, wherein said measurement system uses a mounting error of said fiducial plate on said movable member and positioning errors of said first and second marks on said fiducial 
     
     
        plate..Iaddend..Iadd.48.  An apparatus according to claim 34, further comprising: a measurement system connected to said first and second detection systems to determine a baseline amount of said first detection system by detecting said first and second marks..Iaddend..Iadd.49. An apparatus according to claim 48, wherein said first mark detection system detects said first mark plural times and said measurement system uses, upon determination of said baseline amount, a plurality of detection values of said first detection system..Iaddend..Iadd.50. An apparatus according to claim 48, wherein said second mark detection system detects said second mark plural times and said measurement system uses, upon determination of said baseline amount, a plurality of detection values of said second detection system..Iaddend..Iadd.51. An apparatus according to claim 48, wherein said first and second detection systems detect said first and second marks simultaneously, and said measurement system has an adjusting device which adjusts a positional relationship between said first and second detection systems and said movable member prior to said simultaneous detection..Iaddend..Iadd.52. An apparatus according to claim 51, wherein said adjusting device comprises a drive system which moves said movable member and a position detection system which detects position information of said movable member to control the movement of said movable member based on the dispositions of said first and second mark detection   
     
     
        systems..Iaddend..Iadd.53.  An apparatus according to claim 48, further comprising: a drive system which moves said movable member;   a detection device which detects position information of said movable member; and   a controller, connected to said drive system and said detection device, which controls said drive system based on the position information detected by said detection device to servo-lock said movable member at the time of detection of said first mark or said second mark by said first mark detection system or said second mark detection system..Iaddend..Iadd.54. An apparatus according to claim 53, wherein said detection device includes an interferometer which radiates a laser beam onto a reflection surface arranged on said movable member..Iaddend..Iadd.55. An apparatus according to claim 54, wherein said detection device includes first and second interferometers, having measurement axes which intersect each other on an optical axis of said projection optical system, and a third interferometer having a measurement axis that passes through a center of detection of said first mark detection system and is parallel to one of the measurement axes of said first and second interferometers..Iaddend..Iadd.56. An apparatus according to claim 53, wherein said detection device includes a third mark detection system which detects a third mark arranged on said movable member..Iaddend..Iadd.57. An apparatus according to claim 56, wherein said third mark detection system detects said third mark through said projection optical system..Iaddend..Iadd.58. An apparatus according to claim 56, wherein said third mark detection system detects said third mark and a mark on said mask..Iaddend..Iadd.59. An apparatus according to claim 56, wherein said third mark is arranged on a fiducial plate on which said first and second marks are also formed..Iaddend..Iadd.60. An apparatus according to claim 56, wherein said third mark detection system detects said third mark through an objective optical system which is provided independently of said projection optical system..Iaddend..Iadd.61. An apparatus according to claim 60, wherein said third detection system has a center of detection outside of a projection field of said projection   
     
     
        optical system..Iaddend..Iadd.62.  An exposure apparatus which exposes a substrate with an energy beam through a mask, comprising: a first mark detection system which detects a mark on said substrate through a first optical system different from a second optical system through which the energy beam passes;   a second mark detection system which detects a mark on said mask; and   a mark plate which can be detected by said first and second detection   
     
     
        systems simultaneously..Iaddend..Iadd.63.  An apparatus according to claim 62, wherein said mark plate is formed with a first mark to be detected by said first mark detection system and a second mark to be detected by said second mark detection system, the first and second marks being formed separately from each other..Iaddend..Iadd.64. An apparatus according to claim 62, further comprising a movable member on which said mark plate is arranged and which is arranged on a coordinate system which defines a movement of said substrate..Iaddend..Iadd.65. An apparatus according to claim 64, wherein said movable member is a substrate stage which holds 
     
     
        said substrate..Iaddend..Iadd.66.  An exposure apparatus which exposes a substrate with an energy beam through a mask, comprising: a first mark detection system which detects a mark on said substrate through a first optical system different from a second optical system through which the energy beam passes;   a second mark detection system which detects a mark on said mask; and   a movable member formed with a fiducial mark in such a way that detections of said fiducial mark by said first and second mark detection systems are effected at substantially the same position..Iaddend..Iadd.67. An apparatus according to claim 66, wherein said fiducial mark is detected by said first and second mark detection systems substantially simultaneously..Iaddend..Iadd.68. An apparatus according to claim 66, further comprising an interferometer which detects position information of said movable member, wherein, upon measurement of a baseline of said first mark detection system, results of detection of said fiducial mark by said first and second mark detection system, said position information of said movable member and information concerning a rotation amount of said movable member obtained from said interferometer are used..Iaddend..Iadd.69. An apparatus according to claim 66, wherein said movable member is a substrate stage which holds said substrate..Iaddend..Iadd.70. An apparatus according to claim 66, further comprising:   a mask stage which holds said mask; and   an interferometer which detects position information of said mask stage,   wherein an output of said interferometer is used upon baseline measurement of said first mark detection system..Iaddend..Iadd.71. An apparatus according to claim 70, wherein position information of said mask stage is detected plural times by said interferometer and a plurality of detection results of position information are used upon said baseline measurement..Iaddend..Iadd.72. An apparatus according to claim 66, wherein said second optical system includes a projection optical system which projects an image of a pattern on said mask onto said substrate, and said first mark detection system has a detection area outside of a field of said projection optical system..Iaddend..Iadd.73. An apparatus according to claim 72, wherein said first mark detection system is an off-axis system which has an objective optical system which is provided independently of said projection optical system and which is provided in said first optical system..Iaddend..Iadd.74. An apparatus according to claim 66, wherein said fiducial mark comprises at least a first mark to be detected by said first mark detection system and a second mark to be detected by said second mark detection system, said first mark and said second mark being formed on different positions on said movable member..Iaddend..Iadd.75. An apparatus according to claim 74, further comprising a plate arranged on said movable member, wherein said first and second marks are formed on said plate..Iaddend..Iadd.76. An apparatus according to claim 66, further comprising an interferometer which detects position information of said movable member, wherein, upon measurement of a baseline of said first mark detection system, results of detection of said fiducial mark by said first and second mark detection systems and information concerning a rotation amount of said movable member obtained from said interferometer are used..Iaddend..Iadd.77. An apparatus according to claim 76, further comprising a drive system which servo-locks, upon detection of said fiducial mark by said first mark detection system or said second mark detection system, said movable member using an output of said interferometer..Iaddend..Iadd.78. An apparatus according to claim 76, wherein said first mark detection system detects said fiducial mark plural times and a plurality of results of detection of said fiducial mark by said first mark detection system are used upon said baseline measurement..Iaddend..Iadd.79. An apparatus according to claim 78, wherein said second mark detection system detects said fiducial mark plural times and a plurality of results of detection of said fiducial mark by said second mark detection system are used upon said baseline measurement..Iaddend..Iadd.80. An apparatus according to claim 76, further comprising:   a mark detection system which detects a specific mark arranged on said movable member; and   a drive system which servo-locks, upon detection of said fiducial mark by said first and second mark detection system, said movable member using an output of said mark detection system which detects the specific   
     
     
        mark..Iaddend..Iadd.81.  An apparatus according to claim 80, wherein said mark detection system which detects the specific mark is one of said first 
     
     
        and second mark detection systems..Iaddend..Iadd.82.  An exposure method of exposing a substrate with an energy beam through a mask, comprising: controlling movement of a mark plate formed with first and second marks such that detection of said first mark by a first mark detection system and detection of said second mark by a second mark detection system can be substantially simultaneously effected, in order to measure a baseline of said first mark detection system, which detects a mark on said substrate through a first optical system different from a second optical system through which the energy beam passes; and   effecting exposure of said substrate after said baseline measurement..Iaddend..Iadd.83. An exposure method of exposing a substrate with an energy beam through a mask, comprising:   positioning a mark plate formed with first and second marks such that detection of said first mark by a first mark detection system and detection of said second mark by a second mark detection system can be effected at substantially the same position, in order to measure a baseline of said first mark detection system, which detects a mark on said substrate through a first optical system different from a second optical system through which the energy beam passes; and   effecting exposure of said substrate after said baseline   
     
     
        measurement..Iaddend..Iadd.84.  A method according to claim 83, wherein information concerning a rotation amount of said mark plate is used upon the baseline measurement..Iaddend..Iadd.85. A method according to claim 83, wherein upon the baseline measurement, said mark plate is servo-locked in accordance with information regarding its position..Iaddend..Iadd.86. A method according to claim 83, wherein upon exposure of said substrate, each of said mask and said substrate is moved with respect to said energy beam..Iaddend..Iadd.87. A method according to claim 83, wherein the detection of said first mark by said first mark detection system is effected plural times and a plurality of detection results by said first mark detection system are used upon the baseline 
     
     
        measurement..Iaddend..Iadd.88.  A method according to claim 87, wherein the detection of said second mark by said second mark detection system is effected plural times and a plurality of detection results by said second mark detection system are used upon said baseline measurement..Iaddend..Iadd.89. A method according to claim 83, wherein position information of said mask is used upon the baseline measurement..Iaddend..Iadd.90. A method according to claim 89, wherein position information of said mask in detected plural times and a plurality of detection results of said position information are used upon said baseline measurement..Iaddend..Iadd.91. A projection exposure apparatus which exposes a substrate with a projected image of a mask through a projection optical system, comprising: a substrate stage disposed at the image side of said projection optical system, which holds said substrate;   first and second interferometers having measurement axes parallel to each other and perpendicular to a reflection surface provided on said substrate stage;   a mark detection system which detects a mark disposed on said substrate stage through said projection optical system; and   a controller connected to said first and second interferometers, said controller determining, upon detection of said mark by said mark detection system, the relationship of respective measurement values of said first   
     
     
        and second interferometers..Iaddend..Iadd.92.  An apparatus according to claim 91, wherein said mark detection system detects said mark on said substrate stage and a mark on said mask..Iaddend..Iadd.93. An apparatus according to claim 91, wherein said mark is formed on a fiducial plate arranged on said substrate stage..Iaddend..Iadd.94. An apparatus according to claim 91, further comprising an alignment system which has a center of detection, on the image side of said projection optical system, at a 
     
     
        position different from said mark detection system..Iaddend..Iadd.95.  An apparatus according to claim 94, wherein said mark comprises a first mark portion to be detected by said alignment system and a second mark portion to be detected by said mark detection system, said first and second mark portions being formed on a same plate in a positional relationship corresponding to an arrangement of said alignment system and said mark detection system..Iaddend..Iadd.96. An apparatus according to claim 94, wherein a center of detection of said alignment system is located on a measurement axis of said first interferometer and a measurement axis of said second interferometer intersects an optical axis of said projection optical system..Iaddend..Iadd.97. An apparatus according to claim 94, wherein a center of detection of said alignment system is disposed within a field of said projection optical system..Iaddend..Iadd.98. An apparatus according to claim 94, wherein a center of detection of said alignment system is disposed outside of a field of said projection optical system..Iaddend..Iadd.99. An apparatus according to claim 94, wherein said alignment system has an objective optical system provided independently of said projection optical system, wherein said alignment system detects a mark on said substrate through said objective optical system..Iaddend..Iadd.100. An exposure apparatus which exposes a substrate with an energy beam through a mask, comprising: a first mark detection system to detect a mark on the substrate;   a second mark detection system to detect a mark on the mask;   a movable member formed with a fiducial mark to be detected by said first and second detection systems;   an interferometer to detect position information of said movable member; and   a measurement device connected to said first and second mark detection systems, said measurement device determining a baseline amount of said first mark detection system based on a plurality of detection results of the position information obtained from said interferometer upon detections of said fiducial mark by said first and second mark detection systems and detection results of said first and second mark detection systems..Iaddend..Iadd.101. An apparatus according to claim 100, wherein said fiducial mark comprises a first mark to be detected by said first mark detection system and a second mark to be detected by said second mark detection system, said first and second marks being formed on the same plate with a predetermined positional relationship..Iaddend..Iadd.102. An apparatus according to claim 100, further comprising a projection optical system disposed between said mask and said substrate, wherein said second mark detection system detects said fiducial mark and a mark on said mask through said projection optical system, and said first mark detection system has a center of detection at a position different from a projection point of said mark on said mask by said projection optical system..Iaddend..Iadd.103. An apparatus according to claim 102, wherein a center of detection of said first mark detection system is disposed within a field of said projection optical system..Iaddend..Iadd.104. An apparatus according to claim 102, wherein said first mark detection system has an objective optical system provided independently of said projection optical system, and said first mark detection system detects a mark on said substrate through said objective optical system..Iaddend..Iadd.105. An exposure method of exposing a substrate with an energy beam through a mask, comprising:   detecting a mark plate respectively by a first mark detection system for detecting a mark on said substrate and a second mark detection system for detecting a mark on said mask;   detecting, upon detection of said mark plate, position information of said mark plate plural times; and   determining a baseline amount of said first mark detection system based on detection results of said first and second mark detection systems and a plurality of detection results of the position information..Iaddend..Iadd.106. A method according to claim 105, wherein said mark plate is detected by said first and second mark detection systems substantially simultaneously..Iaddend..Iadd.107. A method according to claim 105, wherein the detections of said mark plate by said first and second detection systems are effected without movement of said mark plate..Iaddend..Iadd.108. A method according to claim 105, further comprising:   detecting position information of said mask upon detection of said mark plate, wherein said position information of the mask is used upon   
     
     
        determining said baseline amount..Iaddend..Iadd.109.  An exposure method of exposing a substrate with a projected image of a mask through a projection optical system, comprising: determining, while detecting a mark on a movable member through said projection optical system, a relationship between measurement values of first and second interferometers which have measurement axes parallel to each other and perpendicular to a reflection surface of said movable member; and   controlling movement of said substrate based on at least one of the measurement values of said first and second interferometers..Iaddend..Iadd.110. A method according to claim 109, wherein said movable member is positioned such that said mark is detected together with at least one specific mark formed on said mask..Iaddend..Iadd.111. A method according to claim 110, further comprising:   detecting said mark on said movable member with an alignment system for detecting a mark on said substrate; and   determining a baseline amount of said alignment system based on a detection result by said alignment system and detection results of said mark on said   
     
     
        movable member and said specific mark..Iaddend..Iadd.112.  A method according to claim 111, wherein a relationship between the measurement axis of said first interferometer and a center of detection of said alignment system is determined, and an output of said first interferometer is used upon detection of said mark on said substrate by said alignment system..Iaddend..Iadd.113. A method according to claim 112, wherein a relationship between the measurement axis of said second interferometer and an optical axis of said projection optical system is determined, and an output of said second interferometer is used at the time of exposure of said substrate..Iaddend.