Inventor · disambiguated record
Roger Caldwell
Also filed as: CALDWELL ROGER · CALDWELL ROGER F
12 granted patents·1 pending application·1,102 citations·filing 1994–2022
94Inventor score
Files withCYPRESS SEMICONDUCTOR CORP6ASML MASKTOOLS BV4INFRASALIENCE LTD1LIFE SENSING INSTR COMPANY INC1TERAXION INC1
Top patents by PatentIndex Score
13 records- 0192US6623895B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2001·Granted Sep 23, 2003·38 cites·23 claims
- 0288US5401691AMethod of fabrication an inverse open frame alignment markCYPRESS SEMICONDUCTOR CORP·Filed 1994·Granted Mar 28, 1995·92 cites·14 claims
- 0387US5919141AVital sign remote monitoring deviceLIFE SENSING INSTR COMPANY INC·Filed 1996·Granted Jul 6, 1999·616 cites·2 claims
- 0485US5503962AChemical-mechanical alignment mark and method of fabricationCYPRESS SEMICONDUCTOR CORP·Filed 1994·Granted Apr 2, 1996·85 cites·23 claims
- 0583US6482555B2Method of patterning sub-0.25λ line features with high transmission, “attenuated” phase shift masksASML MASKTOOLS BV·Filed 2001·Granted Nov 19, 2002·21 cites·28 claims
- 0682US6312854B1Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masksASML MASKTOOLS BV·Filed 1999·Granted Nov 6, 2001·44 cites·32 claims
- 0779US5640053AInverse open frame alignment mark and method of fabricationCYPRESS SEMICONDUCTOR CORP·Filed 1994·Granted Jun 17, 1997·53 cites·7 claims
- 0877US5514622AMethod for the formation of interconnects and landing pads having a thin, conductive film underlying the plug or an associated contact of via holeCYPRESS SEMICONDUCTOR CORP·Filed 1994·Granted May 7, 1996·75 cites·20 claims
- 0975US6835510B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2003·Granted Dec 28, 2004·11 cites·33 claims
- 1075US6016012AThin liner layer providing reduced via resistanceCYPRESS SEMICONDUCTOR CORP·Filed 1996·Granted Jan 18, 2000·56 cites·24 claims
- 1167US2023142620A1Ammonia Synthesis System and MethodINFRASALIENCE LTD·Filed 2022·Application pending·0 cites
- 1259US6833954B2Lithographic method for manufacturing a mask used in the fabrication of a fiber Bragg gratingTERAXION INC·Filed 2001·Granted Dec 21, 2004·6 cites·76 claims
- 1335US5851887ADeep sub-micron polysilicon gap formationCYPRESS SEMICONDUCTOR CORP·Filed 1996·Granted Dec 22, 1998·5 cites·18 claims
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