Inventor · disambiguated record
Jean-Francois De Marneffe
Also filed as: DE MARNEFFE JEAN-FRANCOIS
9 granted patents·4 pending applications·8 citations·filing 2012–2021
79Inventor score
Top patents by PatentIndex Score
13 records- 0189US9859102B2Method of etching porous filmTOKYO ELECTRON LTD·Filed 2016·Granted Jan 2, 2018·5 cites·11 claims
- 0272US9520298B2Plasma method for reducing post-lithography line width roughnessIMEC VZW·Filed 2015·Granted Dec 13, 2016·2 cites·17 claims
- 0363US11495490B2Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 8, 2022·0 cites·5 claims
- 0458US9847262B2Method and apparatus for real-time monitoring of plasma etch uniformityIMEC VZW·Filed 2015·Granted Dec 19, 2017·1 cites·20 claims
- 0555US10910259B2Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2018·Granted Feb 2, 2021·0 cites·8 claims
- 0654US10236162B2Method of etching porous filmTOKYO ELECTRON LTD·Filed 2017·Granted Mar 19, 2019·0 cites·4 claims
- 0753US12009204B2Bias temperature instability of SiO2 layersIMEC VZW·Filed 2021·Granted Jun 11, 2024·0 cites·15 claims
- 0847US11056376B2Removing an organic sacrificial material from a two-dimensional materialIMEC VZW·Filed 2019·Granted Jul 6, 2021·0 cites·16 claims
- 0945US9595422B2Plasma etching of porous substratesIMEC VZW·Filed 2016·Granted Mar 14, 2017·0 cites·15 claims
- 1041US2019271660A1Nanopore formed through fin by self-alignmentIMEC VZW·Filed 2019·Application pending·0 cites
- 1139US2019057859A1Methods and Systems for Forming a Mask LayerIMEC VZW·Filed 2018·Application pending·0 cites
- 1235US2020395221A1Method of etching porous filmTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1332US2012283973A1Plasma probe and method for plasma diagnosticsSAMARA VLADIMIR·Filed 2012·Application pending·0 cites
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