Inventor · disambiguated record
Mathew Hannon
Also filed as: HANNON MATHEW
8 granted patents·2 pending applications·33 citations·filing 2005–2021
83Inventor score
Top patents by PatentIndex Score
10 records- 0194US10343237B2System and method for laser beveling and/or polishingIPG PHOTONICS CORP·Filed 2015·Granted Jul 9, 2019·8 cites·14 claims
- 0293US10807199B2Multi-laser system and method for cutting and post-cut processing hard dielectric materialsIPG PHOTONICS CORP·Filed 2017·Granted Oct 20, 2020·5 cites·12 claims
- 0391US9764427B2Multi-laser system and method for cutting and post-cut processing hard dielectric materialsIPG PHOTONICS CORP·Filed 2015·Granted Sep 19, 2017·5 cites·5 claims
- 0491US9669613B2Laser lift off systems and methods that overlap irradiation zones to provide multiple pulses of laser irradiation per location at an interface between layers to be separatedIPG MICROSYSTEMS LLC·Filed 2013·Granted Jun 6, 2017·11 cites·19 claims
- 0587US10974494B2Laser lift off systems and methods that overlap irradiation zones to provide multiple pulses of laser irradiation per location at an interface between layers to be separatedIPG PHOTONICS CORP·Filed 2017·Granted Apr 13, 2021·2 cites·22 claims
- 0685US11565350B2System and method for laser beveling and/or polishingIPG PHOTONICS CORP·Filed 2019·Granted Jan 31, 2023·2 cites·11 claims
- 0775US11820119B2Laser lift off systems and methods that overlap irradiation zones to provide multiple pulses of laser irradiation per location at an interface between layers to be separatedIPG PHOTONICS CORP·Filed 2021·Granted Nov 21, 2023·0 cites·18 claims
- 0873US11819949B2Multi-laser system and method for cutting and post-cut processing hard dielectric materialsIPG PHOTONICS CORP·Filed 2020·Granted Nov 21, 2023·0 cites·20 claims
- 0947US2005230260A1Plating apparatus and methodSURFECT TECHNOLOGIES INC·Filed 2005·Application pending·0 cites
- 1042US2012234807A1Laser scribing with extended depth affectation into a workplaceSERCEL JEFFREY P·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →