Inventor · disambiguated record
Naoya Hirakawa
Also filed as: HIRAKAWA NAOYA
5 granted patents·66 citations·filing 2002–2004
81Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD5
Top patents by PatentIndex Score
5 records- 0178US6824616B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Nov 30, 2004·20 cites·12 claims
- 0278US6808566B2Reduced-pressure drying unit and coating film forming methodTOKYO ELECTRON LTD·Filed 2002·Granted Oct 26, 2004·20 cites·11 claims
- 0373US6773510B2Substrate processing unitTOKYO ELECTRON LTD·Filed 2002·Granted Aug 10, 2004·17 cites·17 claims
- 0457US7534467B2Reduced-pressure drying unit and coating film forming methodTOKYO ELECTRON LTD·Filed 2004·Granted May 19, 2009·5 cites·1 claims
- 0556US7179504B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Feb 20, 2007·4 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →