Inventor · disambiguated record
Masaki Hirayama
Also filed as: HIRAYAMA MASAK · HIRAYAMA MASAKI
84 granted patents·56 pending applications·2,051 citations·filing 1993–2025
99Inventor score
Top patents by PatentIndex Score
140 records- 0198US6446573B2Plasma process deviceOHMI TADAHIRO·Filed 2001·Granted Sep 10, 2002·572 cites·13 claims
- 0297US8114245B2Plasma etching deviceOHMI TADAHIRO·Filed 2002·Granted Feb 14, 2012·157 cites·12 claims
- 0397US6585851B1Plasma etching deviceOHMI TADAHIRO·Filed 1998·Granted Jul 1, 2003·178 cites·26 claims
- 0496US6830652B1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Dec 14, 2004·84 cites·13 claims
- 0595US6350376B1Reductive heat exchange water and heat exchange system using such waterORGANO CORP·Filed 2000·Granted Feb 26, 2002·63 cites·13 claims
- 0692US11923170B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 5, 2024·6 cites·20 claims
- 0792US6975018B2Semiconductor deviceOHMI TADAHIRO·Filed 2001·Granted Dec 13, 2005·49 cites·4 claims
- 0892US6357385B1Plasma deviceOHMI TADAHIRO·Filed 1998·Granted Mar 19, 2002·124 cites·33 claims
- 0991US8733281B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted May 27, 2014·5 cites·16 claims
- 1091US6929830B2Plasma treatment method and method of manufacturing optical parts using the sameCANON KK·Filed 2003·Granted Aug 16, 2005·50 cites·12 claims
- 1190US7819082B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Oct 26, 2010·8 cites·3 claims
- 1289US11854772B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 26, 2023·4 cites·18 claims
- 1389US7723637B2Plasma processing apparatusUNIV TOHOKU·Filed 2006·Granted May 25, 2010·15 cites·9 claims
- 1489US7312415B2Plasma method with high input powerFOUND ADVANCEMENT INT SCIENCE·Filed 2003·Granted Dec 25, 2007·40 cites·9 claims
- 1589US6286454B1Plasma process deviceTADAHIRO OHMI·Filed 2000·Granted Sep 11, 2001·35 cites·27 claims
- 1688US12087552B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 10, 2024·4 cites·2 claims
- 1788US6620290B2Plasma process apparatusSHARP KK·Filed 2001·Granted Sep 16, 2003·30 cites·3 claims
- 1887US6818852B2Microwave plasma processing device, plasma processing method, and microwave radiating memberOHMI TADAHIRO·Filed 2002·Granted Nov 16, 2004·39 cites·20 claims
- 1987US5714795ASemiconductor device utilizing silicide reactionOHMI TADAHIRO·Filed 1995·Granted Feb 3, 1998·89 cites·37 claims
- 2086US6690702B1Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tubeCANON KK·Filed 2000·Granted Feb 10, 2004·23 cites·5 claims
- 2185US7115184B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2002·Granted Oct 3, 2006·28 cites·13 claims
- 2285US6527908B2Plasma process apparatusSHARP KK·Filed 2001·Granted Mar 4, 2003·40 cites·7 claims
- 2382US7520245B2Plasma processing apparatusOHMI TADAHIRO·Filed 2004·Granted Apr 21, 2009·17 cites·8 claims
- 2482US7432468B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 7, 2008·8 cites·14 claims
- 2582US6638392B2Plasma process apparatusSHARP KK·Filed 2000·Granted Oct 28, 2003·18 cites·7 claims
- 2681US7439121B2Dielectric film and method of forming it, semiconductor device, non-volatile semiconductor memory device, and production method for semiconductor deviceFOUND ADVANCEMENT INT SCIENCE·Filed 2001·Granted Oct 21, 2008·21 cites·45 claims
- 2780US7670454B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Mar 2, 2010·6 cites·2 claims
- 2879US7718484B2Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric filmFOUND ADVANCEMENT INT SCIENCE·Filed 2007·Granted May 18, 2010·5 cites·6 claims
- 2979US6726802B2Plasma processing apparatusSHARP KK·Filed 2002·Granted Apr 27, 2004·14 cites·8 claims
- 3079US6153068AParallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic fieldOHMI TADAHIRO·Filed 1998·Granted Nov 28, 2000·34 cites·2 claims
- 3177US11118262B2Substrate processing apparatus having a gas-mixing manifoldASM IP HOLDING BV·Filed 2018·Granted Sep 14, 2021·1 cites·14 claims
- 3276US7083701B2Device and method for plasma processing, and slow-wave plateTOKYO ELECTRON LTD·Filed 2002·Granted Aug 1, 2006·16 cites·6 claims
- 3375US8327796B2Plasma processing apparatus and plasma processing methodHIRAYAMA MASAKI·Filed 2009·Granted Dec 11, 2012·3 cites·22 claims
- 3475US7325511B2Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatusGOTO NAOHISA·Filed 2002·Granted Feb 5, 2008·12 cites·29 claims
- 3575US7141756B2Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Nov 28, 2006·11 cites·23 claims
- 3674US8573151B2Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric windowOHMI TADAHIRO·Filed 2009·Granted Nov 5, 2013·3 cites·18 claims
- 3774US7097735B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2002·Granted Aug 29, 2006·16 cites·58 claims
- 3874US6829279B1Laser oscillating apparatus, exposure apparatus using the same and device fabrication methodCANON KK·Filed 2000·Granted Dec 7, 2004·13 cites·42 claims
- 3974US2024429032A1Wafer support deviceSUMITOMO OSAKA CEMENT CO LTD·Filed 2024·Application pending·0 cites
- 4073US8568556B2Plasma processing apparatus and method for using plasma processing apparatusHIRAYAMA MASAKI·Filed 2008·Granted Oct 29, 2013·4 cites·16 claims
- 4173US6736606B1Vacuum apparatusOHMI TADAHIRO·Filed 2000·Granted May 18, 2004·16 cites·12 claims
- 4272US2025336645A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4371US10354844B2Insulator structure for avoiding abnormal electrical discharge and plasma concentrationASM IP HOLDING BV·Filed 2017·Granted Jul 16, 2019·1 cites·20 claims
- 4471US6609564B2Reductive heat exchange water and heat exchange system using such waterORGANO CORP·Filed 2001·Granted Aug 26, 2003·12 cites·5 claims
- 4571US2025292997A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4670US6783628B2Plasma processing apparatusSHARP KK·Filed 2001·Granted Aug 31, 2004·8 cites·5 claims
- 4770US6675737B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 13, 2004·10 cites·9 claims
- 4870US2025292999A1Matching circuit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4969US11443927B2Plasma treatment deviceTOKYO ELECTRON LTD·Filed 2017·Granted Sep 13, 2022·1 cites·2 claims
- 5069US8059875B2Information processor, method of detecting factor influencing health, and programUEHARA SAYURI·Filed 2007·Granted Nov 15, 2011·3 cites·5 claims
Showing the top 50 of 140 patent records by PatentIndex Score.
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