Inventor
MATSUDA TETSUO
JP62 patents
⚠️ This page may combine multiple inventors who share the name “MATSUDA TETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
38 patentsUS6251763B1Jun 26, 2001
Semiconductor device and method for manufacturing same
TOSHIBA KK114 citations99
US5413967AMay 9, 1995
Method of manufacturing semiconductor devices
TOSHIBA KK292 citations99
US6563308B2May 13, 2003
Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium
TOSHIBA KK144 citations98
US6375823B1Apr 23, 2002
Plating method and plating apparatus
TOSHIBA KK96 citations98
US6348402B1Feb 19, 2002
Method of manufacturing a copper interconnect
TOSHIBA KK87 citations98
US6229211B1May 8, 2001
Semiconductor device and method of manufacturing the same
TOSHIBA KK88 citations98
US6403481B1Jun 11, 2002
Film formation method
TOSHIBA KK55 citations96
US6291891B1Sep 18, 2001
Semiconductor device manufacturing method and semiconductor device
TOSHIBA KK69 citations96
US6150270ANov 21, 2000
Method for forming barrier layer for copper metallization
TOSHIBA KK54 citations96
US5998100ADec 7, 1999
Fabrication process using a multi-layer antireflective layer
TOSHIBA KK89 citations96
US5759746AJun 2, 1998
Fabrication process using a thin resist
TOSHIBA KK75 citations96
US5679610AOct 21, 1997
Method of planarizing a semiconductor workpiece surface
TOSHIBA KK59 citations96
US5132756AJul 21, 1992
Method of manufacturing semiconductor devices
TOSHIBA KK78 citations96
US4866009ASep 12, 1989
Multilayer wiring technique for a semiconductor device
TOSHIBA KK55 citations96
US6913681B2Jul 5, 2005
Plating method and plating apparatus
TOSHIBA KK20 citations93
US6787827B2Sep 7, 2004
Semiconductor device and method for manufacturing the same
TOSHIBA KK30 citations93
US6611060B1Aug 26, 2003
Semiconductor device having a damascene type wiring layer
TOSHIBA KK26 citations93
US6579785B2Jun 17, 2003
Method of making multi-level wiring in a semiconductor device
TOSHIBA KK31 citations93
US6342444B1Jan 29, 2002
Method of forming diffusion barrier for copper interconnects
TOSHIBA KK32 citations93
US6333215B1Dec 25, 2001
Method for manufacturing a semiconductor device
TOSHIBA KK31 citations93
US5094879AMar 10, 1992
Method of activating at least one gas to produce different charged species, selecting specific species, decelerating the species, and chemically reacting the species to form a thin film
TOSHIBA KK24 citations93
US4923715AMay 8, 1990
Method of forming thin film by chemical vapor deposition
TOSHIBA KK50 citations93
US7595530B2Sep 29, 2009
Power semiconductor device with epitaxially-filled trenches
TOSHIBA KK12 citations92
US6518177B1Feb 11, 2003
Method of manufacturing a semiconductor device
TOSHIBA KK23 citations92
US6368951B2Apr 9, 2002
Semiconductor device manufacturing method and semiconductor device
TOSHIBA KK16 citations92
US7420245B2Sep 2, 2008
Semiconductor device and method of manufacturing the same
TOSHIBA KK12 citations84
US7214305B2May 8, 2007
Method of manufacturing electronic device
TOSHIBA KK12 citations84
US9947751B2Apr 17, 2018
Semiconductor device and method of manufacturing the same
TOSHIBA KK6 citations82
US6764585B2Jul 20, 2004
Electronic device manufacturing method
TOSHIBA KK8 citations74
US6750143B1Jun 15, 2004
Method for forming a plating film, and device for forming the same
TOSHIBA KK7 citations74
US6632476B2Oct 14, 2003
Substrate processing method and substrate processing apparatus
TOSHIBA KK8 citations74
US6403997B1Jun 11, 2002
Method for manufacturing semiconductor devices
TOSHIBA KK11 citations74
US5958630ASep 28, 1999
Phase shifting mask and method of manufacturing the same
TOSHIBA KK13 citations74
US5658389AAug 19, 1997
Thin film forming method and apparatus
TOSHIBA KK9 citations74
US7936015B2May 3, 2011
Semiconductor device having trenches filled with a semiconductor having an impurity concentration gradient
TOSHIBA KK2 citations63
US7898031B2Mar 1, 2011
Semiconductor device with tapered trenches and impurity concentration gradients
TOSHIBA KK3 citations63
US7575664B2Aug 18, 2009
Plating method
TOSHIBA KK3 citations63
US6998342B2Feb 14, 2006
Electronic device manufacturing method
TOSHIBA KK2 citations63
TOYO JOZO KK
7 patentsUS3960757AJun 1, 1976
Process for encapsulation of medicaments
TOYO JOZO KK285 citations98
US3978210AAug 31, 1976
Antibiotic aculeacins
TOYO JOZO KK52 citations90
US4118336AOct 3, 1978
Novel cellulose microcapsules and preparation thereof
TOYO JOZO KK35 citations89
US4268665AMay 19, 1981
Derivatives of antibiotic tylosin
TOYO JOZO KK12 citations73
US4345069AAug 17, 1982
Deformyltylosin derivatives
TOYO JOZO KK18 citations72
US3960662AJun 1, 1976
Process for the production of 7-amino-cephem compounds
TOYO JOZO KK18 citations72
US3988309AOct 26, 1976
EEL calcitonin
TOYO JOZO KK7 citations68
EBARA CORP
3 patentsIBM
1 patentIMAMURA TOMOMI
1 patentShowing the top 50 of 62 patents by PatentIndex Score.