Inventor
HAH JUNG-HWAN
KR17 patents
⚠️ This page may combine multiple inventors who share the name “HAH JUNG-HWAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
14 patentsUS7855038B2Dec 21, 2010
Mask patterns for semiconductor device fabrication and related methods and structures
SAMSUNG ELECTRONICS CO LTD21 citations92
US7361609B2Apr 22, 2008
Mask patterns for semiconductor device fabrication and related methods
SAMSUNG ELECTRONICS CO LTD27 citations92
US7314691B2Jan 1, 2008
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD18 citations92
US7384730B2Jun 10, 2008
Top coating composition for photoresist and method of forming photoresist pattern using same
SAMSUNG ELECTRONICS CO LTD13 citations84
US8013366B2Sep 6, 2011
Biosensor using nanoscale material as transistor channel and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD14 citations83
US7604911B2Oct 20, 2009
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations73
US8034747B2Oct 11, 2011
Photolabile compound, oligomer probe array and substrate for oligomer probe array containing the same, and manufacturing method of the same
SAMSUNG ELECTRONICS CO LTD0 citations50
US7935519B2May 3, 2011
DNA chip, DNA chip kit, and method of manufacturing the DNA chip
SAMSUNG ELECTRONICS CO LTD0 citations49
US7851125B2Dec 14, 2010
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations48
US7994097B2Aug 9, 2011
Microarray, substrate for microarray and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations47
US7985529B2Jul 26, 2011
Mask patterns including gel layers for semiconductor device fabrication
SAMSUNG ELECTRONICS CO LTD0 citations41
US7713634B2May 11, 2010
Non-linear silicon compound, method of manufacturing oligomer probe array using the same, substrate for oligomer probe array with the same, and oligomer probe array with the same
SAMSUNG ELECTRONICS CO LTD0 citations39
US7667032B2Feb 23, 2010
Method of manufacturing a microarray
SAMSUNG ELECTRONICS CO LTD0 citations39
US7566773B2Jul 28, 2009
Photolabile compound and substrate for oligomer probe array with the same
SAMSUNG ELECTRONICS CO LTD0 citations39
HAH JUNG-HWAN
3 patentsUS8551759B2Oct 8, 2013
Oligomer probe array and method of producing the same
HAH JUNG-HWAN0 citations47
US8241837B2Aug 14, 2012
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
HAH JUNG-HWAN0 citations45
US8546130B2Oct 1, 2013
Oligomer probe array with improved signal-to-noise ratio fabrication method thereof
HAH JUNG-HWAN0 citations36