Inventor

KIMBA TOSHIFUMI

JP73 patents

⚠️ This page may combine multiple inventors who share the name “KIMBA TOSHIFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KIMBA TOSHIFUMI

EBARA CORP

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

Method for inspecting substrate, substrate inspecting system and electron beam apparatus

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Inspection system by charged particle beam and method of manufacturing devices using the system

Electron beam apparatus and device fabrication method using the electron beam apparatus

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

Inspection system by charged particle beam and method of manufacturing devices using the system

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

Inspection system by charged particle beam and method of manufacturing devices using the system

Sheet beam-type testing apparatus

Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus

Inspection system by charged particle beam and method of manufacturing devices using the system

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

Sheet beam-type testing apparatus

Inspection system by charged particle beam and method of manufacturing devices using the system

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

Inspection system by charged particle beam and method of manufacturing devices using the system

Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Sheet beam-type inspection apparatus

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

Electron beam apparatus and device production method using the electron beam apparatus

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus

Method and apparatus for measuring film thickness

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

Polishing method and polishing apparatus

Polishing pad for substrate polishing apparatus

Inspection system by charged particle beam and method of manufacturing devices using the system

Polishing end point detection method, polishing end point detection apparatus and polishing apparatus

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Sheet beam-type testing apparatus

Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method

Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples

Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method

Inspection system by charged particle beam and method of manufacturing devices using the system

Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus

Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

Electron beam apparatus for inspecting a pattern on a sample using multiple electron beams

KIMBA TOSHIFUMI

Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former

Polishing end point detection method, polishing end point detection apparatus, and polishing apparatus

XY-coordinate compensation apparatus and method in sample pattern inspection apparatus

Method of monitoring progress of substrate polishing and polishing apparatus

TOSHIBA KK

Inspection system by charged particle beam and method of manufacturing devices using the system

NIKON CORP

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

NOJI NOBUHARU

Testing apparatus using charged particles and device manufacturing method using the testing apparatus

NAKASUJI MAMORU

Electron beam apparatus