USD731448SActiveUtility

Polishing pad for substrate polishing apparatus

71
Assignee: EBARA CORPPriority: Oct 29, 2013Filed: Apr 28, 2014Granted: Jun 9, 2015
Est. expiryOct 29, 2033(~7.3 yrs left)· nominal 20-yr term from priority
Inventors:Masaki KinoshitaToshifumi Kimba
71
PatentIndex Score
16
Cited by
13
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a polishing pad for substrate polishing apparatus, as shown and described.

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