Inventor
NOZAWA SYUJI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “NOZAWA SYUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
22 patentsUS10960435B2Mar 30, 2021
Film forming apparatus, film forming method, and storage medium
TOKYO ELECTRON LTD2 citations73
US10446438B2Oct 15, 2019
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD2 citations73
US10096499B2Oct 9, 2018
Substrate processing method, program, control apparatus, film forming apparatus, and substrate processing system
TOKYO ELECTRON LTD3 citations72
US7481944B2Jan 27, 2009
Etch amount detection method, etching method, and etching system
TOKYO ELECTRON LTD7 citations69
US11923242B2Mar 5, 2024
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations62
US11843027B2Dec 12, 2023
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations62
US11282699B2Mar 22, 2022
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US7662646B2Feb 16, 2010
Plasma processing method and plasma processing apparatus for performing accurate end point detection
TOKYO ELECTRON LTD2 citations62
US11387139B2Jul 12, 2022
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations61
US11342223B2May 24, 2022
Semiconductor device manufacturing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11081321B2Aug 3, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations61
US10957531B2Mar 23, 2021
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations61
US11139313B2Oct 5, 2021
Method of manufacturing semiconductor memory
TOKYO ELECTRON LTD1 citations60
US11069536B2Jul 20, 2021
Device manufacturing method
TOKYO ELECTRON LTD0 citations60
US12051571B2Jul 30, 2024
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD0 citations58
US10755971B2Aug 25, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations52
US10629448B2Apr 21, 2020
Method of manufacturing semiconductor device and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US10490405B2Nov 26, 2019
Semiconductor device manufacturing method, substrate processing apparatus and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US12297539B2May 13, 2025
Film forming system and film forming method
TOKYO ELECTRON LTD0 citations51
US12104251B2Oct 1, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US11694891B2Jul 4, 2023
Film forming apparatus and film forming method
TOKYO ELECTRON LTD0 citations51
US10790135B2Sep 29, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations51