Inventor
LEE SUNG KOO
KR23 patents
⚠️ This page may combine multiple inventors who share the name “LEE SUNG KOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYNIX SEMICONDUCTOR INC
12 patentsUS7238653B2Jul 3, 2007
Cleaning solution for photoresist and method for forming pattern using the same
HYNIX SEMICONDUCTOR INC464 citations98
US6703323B2Mar 9, 2004
Method of inhibiting pattern collapse using a relacs material
HYNIX SEMICONDUCTOR INC49 citations92
US7807336B2Oct 5, 2010
Method for manufacturing semiconductor device
HYNIX SEMICONDUCTOR INC2 citations62
US7749680B2Jul 6, 2010
Photoresist composition and method for forming pattern of a semiconductor device
HYNIX SEMICONDUCTOR INC2 citations62
US7655568B2Feb 2, 2010
Method for manufacturing underlying pattern of semiconductor device
HYNIX SEMICONDUCTOR INC6 citations62
US7563753B2Jul 21, 2009
Cleaning solution for removing photoresist
HYNIX SEMICONDUCTOR INC2 citations62
US7759052B2Jul 20, 2010
Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
HYNIX SEMICONDUCTOR INC0 citations52
US7235349B2Jun 26, 2007
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
HYNIX SEMICONDUCTOR INC0 citations52
US7138218B2Nov 21, 2006
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
HYNIX SEMICONDUCTOR INC0 citations52
US7081325B2Jul 25, 2006
Photoresist polymer and photoresist composition including the same
HYNIX SEMICONDUCTOR INC0 citations52
US7220679B2May 22, 2007
Method for forming patterns in a semiconductor device
HYNIX SEMICONDUCTOR INC0 citations51
US6764964B2Jul 20, 2004
Method for forming patterns of a semiconductor device
HYNIX SEMICONDUCTOR INC0 citations51
KOREA INST IND TECH
2 patentsUS11535693B2Dec 27, 2022
Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same
KOREA INST IND TECH0 citations53
US11692055B2Jul 4, 2023
Composition for forming polyurethane film and article comprising coating layer derived from the same
KOREA INST IND TECH0 citations44