Inventor · disambiguated record
Shuichi Ishizuka
Also filed as: ISHIZUKA SHUICHI
10 granted patents·718 citations·filing 1993–2001
92Inventor score
Files withTOKYO ELECTRON LTD10
Top patents by PatentIndex Score
10 records- 0197US5522934APlasma processing apparatus using vertical gas inlets one on top of anotherTOKYO ELECTRON LTD·Filed 1995·Granted Jun 4, 1996·322 cites·14 claims
- 0292US5531834APlasma film forming method and apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 2, 1996·161 cites·10 claims
- 0390US5476182AEtching apparatus and method thereforTOKYO ELECTRON LTD·Filed 1993·Granted Dec 19, 1995·66 cites·32 claims
- 0486US6355902B2Plasma film forming method and plasma film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 12, 2002·23 cites·6 claims
- 0585US6215087B1Plasma film forming method and plasma film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Apr 10, 2001·57 cites·7 claims
- 0682US6419985B1Method for producing insulator filmTOKYO ELECTRON LTD·Filed 2000·Granted Jul 16, 2002·28 cites·5 claims
- 0770US6537904B1Method for manufacturing a semiconductor device having a fluorine containing carbon inter-layer dielectric filmTOKYO ELECTRON LTD·Filed 2000·Granted Mar 25, 2003·14 cites·5 claims
- 0868US6087614APlasma treating deviceTOKYO ELECTRON LTD·Filed 1997·Granted Jul 11, 2000·21 cites·12 claims
- 0959US6443165B1Method for cleaning plasma treatment device and plasma treatment systemTOKYO ELECTRON LTD·Filed 1997·Granted Sep 3, 2002·24 cites·3 claims
- 1032US6727182B2Process for the production of semiconductor deviceTOKYO ELECTRON LTD·Filed 1997·Granted Apr 27, 2004·2 cites·3 claims
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