Inventor · disambiguated record
Kimihiro Higuchi
Also filed as: HIGUCHI KIMIHIRO
15 granted patents·1 pending application·383 citations·filing 1995–2014
94Inventor score
Top patents by PatentIndex Score
16 records- 0195US5980767AMethod and devices for detecting the end point of plasma processTOKYO ELECTRON LTD·Filed 1997·Granted Nov 9, 1999·116 cites·13 claims
- 0294US8387562B2Plasma processor and plasma processing methodKIKUCHI AKIHIRO·Filed 2011·Granted Mar 5, 2013·22 cites·12 claims
- 0393US9437402B2Plasma processor and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 6, 2016·11 cites·9 claims
- 0493US8056503B2Plasma procesor and plasma processing methodKIKUCHI AKIHIRO·Filed 2002·Granted Nov 15, 2011·47 cites·31 claims
- 0592US8904957B2Plasma processor and plasma processing methodTOKYO ELECTRON LTD·Filed 2013·Granted Dec 9, 2014·12 cites·2 claims
- 0688US7713431B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2005·Granted May 11, 2010·16 cites·3 claims
- 0787US6676804B1Method and apparatus for plasma processingTOKYO ELECTRON AT LTD·Filed 1999·Granted Jan 13, 2004·82 cites·10 claims
- 0885US9728381B2Plasma processor and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 8, 2017·4 cites·3 claims
- 0979US7541283B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Jun 2, 2009·5 cites·10 claims
- 1075US5783492APlasma processing method, plasma processing apparatus, and plasma generating apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Jul 21, 1998·50 cites·10 claims
- 1173US7799238B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Sep 21, 2010·3 cites·5 claims
- 1264US7335278B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON AT LTD·Filed 2003·Granted Feb 26, 2008·8 cites·5 claims
- 1358US7465673B2Method and apparatus for bilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2003·Granted Dec 16, 2008·7 cites·14 claims
- 1445US8343372B2Surface processing method for mounting stageTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·0 cites·8 claims
- 1543US8287750B2Plasma processing method and plasma processing apparatusSHINDO TOSHIHIKO·Filed 2010·Granted Oct 16, 2012·0 cites·7 claims
- 1643US2006081337A1Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2005·Application pending·0 cites
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