Inventor · disambiguated record
Hideomi Hane
Also filed as: HANE HIDEOMI
13 granted patents·5 pending applications·7 citations·filing 2015–2025
83Inventor score
Files withTOKYO ELECTRON LTD18
Top patents by PatentIndex Score
18 records- 0181US11201053B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 14, 2021·1 cites·3 claims
- 0277US10438791B2Film forming method, film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 8, 2019·2 cites·7 claims
- 0372US9388496B2Method for depositing a film on a substrate, and film deposition apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jul 12, 2016·2 cites·7 claims
- 0469US10714332B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·4 claims
- 0569US10344382B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jul 9, 2019·1 cites·10 claims
- 0660US2025246417A1Plasma purge method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0756US10900121B2Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·0 cites·4 claims
- 0855US11414753B2Processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 16, 2022·0 cites·13 claims
- 0954US12077855B2Cleaning method and film deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·7 claims
- 1054US2019292662A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1151US11725276B2Plasma purge methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 15, 2023·0 cites·8 claims
- 1249US12454757B2Heat treatment apparatus, control method, and storage mediumTOKYO ELECTRON LTD·Filed 2022·Granted Oct 28, 2025·0 cites·10 claims
- 1345US11970768B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 30, 2024·0 cites·7 claims
- 1445US2022081766A1Plasma purge methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1544US10550470B2Film forming apparatus and operation method of film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·0 cites·10 claims
- 1643US11171014B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 9, 2021·0 cites·4 claims
- 1742US2021054501A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1837US2018237914A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →