Inventor

EBATA SHINYA

JP13 patents

⚠️ This page may combine multiple inventors who share the name “EBATA SHINYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOKUSAI ELECTRIC CORP

10 patents

USD888196SJun 23, 2020

Gas nozzle for substrate processing apparatus

KOKUSAI ELECTRIC CORP16 citations85

USD925481SJul 20, 2021

Inlet liner for substrate processing apparatus

KOKUSAI ELECTRIC CORP3 citations72

US10907253B2Feb 2, 2021

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

KOKUSAI ELECTRIC CORP4 citations72

US12540388B2Feb 3, 2026

Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US12365987B2Jul 22, 2025

Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US12053805B2Aug 6, 2024

Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US11591694B2Feb 28, 2023

Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US12139787B2Nov 12, 2024

Apparatus and method for cleaning reaction vessel for processing substrate

KOKUSAI ELECTRIC CORP0 citations51

US11170995B2Nov 9, 2021

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations51

US12518964B2Jan 6, 2026

Method of manufacturing semiconductor device, method of processing substrate, recording medium, and substrate processing apparatus

KOKUSAI ELECTRIC CORP0 citations50

HITACHI INT ELECTRIC INC

3 patents

USD853979SJul 16, 2019

Reaction tube

HITACHI INT ELECTRIC INC10 citations83

USD889596SJul 7, 2020

Gas nozzle for substrate processing apparatus

HITACHI INT ELECTRIC INC5 citations72

US9508531B2Nov 29, 2016

Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber

HITACHI INT ELECTRIC INC2 citations61