USD888196SActiveUtility

Gas nozzle for substrate processing apparatus

75
Assignee: KOKUSAI ELECTRIC CORPPriority: Jul 5, 2018Filed: Jul 5, 2018Granted: Jun 23, 2020
Est. expiryJul 5, 2038(~12 yrs left)· nominal 20-yr term from priority
Inventors:Yusaku OkajimaToru KagayaHiroaki HiramatsuShinya Ebata
75
PatentIndex Score
16
Cited by
12
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a gas nozzle for substrate processing apparatus, as shown and described.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.