Inventor · disambiguated record
Shinya Ebata
Also filed as: EBATA SHINYA
11 granted patents·3 pending applications·40 citations·filing 2014–2025
86Inventor score
Top patents by PatentIndex Score
14 records- 0187US10907253B2Method of manufacturing semiconductor device, substrate processing apparatus and recording mediumKOKUSAI ELECTRIC CORP·Filed 2018·Granted Feb 2, 2021·4 cites·21 claims
- 0287US2025340992A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 0378US12365987B2Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Granted Jul 22, 2025·0 cites·23 claims
- 0475USD888196SGas nozzle for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2018·Granted Jun 23, 2020·16 cites·1 claims
- 0569US11591694B2Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Feb 28, 2023·0 cites·22 claims
- 0667US9508531B2Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamberHITACHI INT ELECTRIC INC·Filed 2014·Granted Nov 29, 2016·2 cites·9 claims
- 0766US2025115993A1Substrate processing apparatus, cleaning method, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 0865USD853979SReaction tubeHITACHI INT ELECTRIC INC·Filed 2018·Granted Jul 16, 2019·10 cites·1 claims
- 0959US2024425972A1Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1053US12053805B2Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Aug 6, 2024·0 cites·21 claims
- 1149USD889596SGas nozzle for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Jul 7, 2020·5 cites·1 claims
- 1248US12139787B2Apparatus and method for cleaning reaction vessel for processing substrateKOKUSAI ELECTRIC CORP·Filed 2020·Granted Nov 12, 2024·0 cites·14 claims
- 1344US11170995B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Nov 9, 2021·0 cites·18 claims
- 1442USD925481SInlet liner for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2019·Granted Jul 20, 2021·3 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →