Inventor

YANG CHAN-LON

US130 patents

⚠️ This page may combine multiple inventors who share the name “YANG CHAN-LON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG CHAN-LON

APPLIED MATERIALS INC

Plasma reactor and processes using RF inductive coupling and scavenger temperature control

Selectivity for etching an oxide over a nitride

Plasma reactor using inductive RF coupling, and processes

Method for processing substrates using gaseous silicon scavenger

Process used in an RF coupled plasma reactor

Silicon scavenger in an inductively coupled RF plasma reactor

Method for plasma processing using magnetically enhanced plasma chemical vapor deposition

UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers

VHF/UHF reactor system

Plasma reactor using inductive RF coupling, and processes

Magnetic confinement in a plasma reactor having an RF bias electrode

Plasma etch processes

Plasma reactor with heated source of a polymer-hardening precursor material

Plasma reactor with heated source of a polymer-hardening precursor material

Method and apparatus for depositing an etch stop layer

Method and apparatus for depositing an etch stop layer

Plasma reactor with heated source of a polymer-hardening precursor material

High temperature silicon surface providing high selectivity in an oxide etch process

Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography

High selectivity oxide etch process for integrated circuit structures

Plasma reactor with heated source of a polymer-hardening precursor material

Plasma reactor with heated source of a polymer-hardening precursor material

UNITED MICROELECTRONICS CORP

Eliminating etching microloading effect by in situ deposition and etching

Process for low k organic dielectric film etch

Method of patterning a dual damascene

Shrinking equal effect critical dimension of mask by in situ polymer deposition and etching

Etching method

Method of cleaning a dual damascene structure

Method for cleaning the surface of a semiconductor wafer

Method of cleaning the polymer from within holes on a semiconductor wafer

Method for forming a contact opening with multilevel etching

Method of removing photoresist and reducing native oxide in dual damascene copper process

Method of forming dual damascene structure

Method for removing photoresist layer

Semiconductor device having metal gate and manufacturing method thereof

Method for removing etching residues

Method for forming a contact hole on a semiconductor wafer

CYPRESS SEMICONDUCTOR CORP

Structure and method for making a notched transistor with spacers

Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby

In situ hard mask approach for self-aligned contact etch

Methods for cleaning contact openings to reduce contact resistance

Gate etch process

TAIWAN SEMICONDUCTOR MFG CO LTD

Multiple gate field-effect transistors having oxygen-scavenged gate stack

Power rails for stacked semiconductor device

Semiconductor device and manufacturing method thereof

Fin structure of semiconductor device, manufacturing method thereof, and manufacturing method of active region of semiconductor device

LIAO PO-JUI

Semiconductor device having metal gate and manufacturing method thereof

Method of manufacturing semiconductor device having metal gate

GUO TED MING-LANG

Method of fabricating a semiconductor structure

YANG CHAN-LON

Metal gate structure and manufacturing method thereof