P

Inventor

TAKAHASHI TOMOWAKI

JP38 patents
⚠️ This page may combine multiple inventors who share the name “TAKAHASHI TOMOWAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

28 patents
US6172825B1Jan 9, 2001

Catoptric reduction projection optical system and projection exposure apparatus and method using same

NIKON CORP175 citations99
US5861997AJan 19, 1999

Catadioptric reduction projection optical system and exposure apparatus having the same

NIKON CORP185 citations99
US5808805ASep 15, 1998

Exposure apparatus having catadioptric projection optical system

NIKON CORP98 citations99
US5691802ANov 25, 1997

Catadioptric optical system and exposure apparatus having the same

NIKON CORP178 citations99
US5689377ANov 18, 1997

Catadioptric optical system and exposure apparatus having the same

NIKON CORP274 citations99
US5636066AJun 3, 1997

Optical apparatus

NIKON CORP190 citations99
US5805334ASep 8, 1998

Catadioptric projection systems

NIKON CORP98 citations98
US7030965B2Apr 18, 2006

Catadioptric system and exposure device having this system

NIKON CORP56 citations96
US6707616B1Mar 16, 2004

Projection exposure apparatus, projection exposure method and catadioptric optical system

NIKON CORP53 citations96
US6213610B1Apr 10, 2001

Catoptric reduction projection optical system and exposure apparatus and method using same

NIKON CORP80 citations96
US6157498ADec 5, 2000

Dual-imaging optical system

NIKON CORP78 citations96
US6109756AAug 29, 2000

Catoptric reduction projection optical system

NIKON CORP59 citations96
US5999333ADec 7, 1999

Exposure apparatus having catadioptric projection optical system

NIKON CORP76 citations96
US6097537AAug 1, 2000

Catadioptric optical system

NIKON CORP64 citations95
US6538821B2Mar 25, 2003

Projection optical system

NIKON CORP33 citations93
US6392822B1May 21, 2002

Dual-imaging optical system

NIKON CORP36 citations93
US6302548B2Oct 16, 2001

Catoptric reduction projection optical system and exposure apparatus and method using same

NIKON CORP43 citations93
US5969882AOct 19, 1999

Catadioptric optical system

NIKON CORP46 citations93
US5956182ASep 21, 1999

Projection optical system

NIKON CORP32 citations93
US7283206B2Oct 16, 2007

Projection optical system, exposure apparatus, and device manufacturing method

NIKON CORP20 citations84
US7483122B2Jan 27, 2009

Projection optical system, exposure apparatus, and exposure method

NIKON CORP7 citations74
US7312851B2Dec 25, 2007

Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop

NIKON CORP7 citations74
US6781766B2Aug 24, 2004

Projection optical system

NIKON CORP6 citations74
US7692767B2Apr 6, 2010

Projection optical system and exposure apparatus with the same

NIKON CORP2 citations63
US7436589B2Oct 14, 2008

Reflective-type projection optical system and exposure apparatus equipped with said reflective-type projection optical system

NIKON CORP2 citations63
US7470033B2Dec 30, 2008

Reflection-type projection-optical systems, and exposure apparatus comprising same

NIKON CORP1 citations52
US6867931B2Mar 15, 2005

Dual-imaging optical system

NIKON CORP0 citations52
US7630057B2Dec 8, 2009

Projection optical system, exposure apparatus, and device manufacturing method

NIKON CORP0 citations42

NIPPON KOGAKU KK

10 patents