Inventor · disambiguated record
Michael S. Hibbs
Also filed as: HIBBS MICHAEL S · HIBBS MICHAEL STRAIGHT
42 granted patents·1 pending application·998 citations·filing 1992–2013
98Inventor score
Top patents by PatentIndex Score
43 records- 0196US6190836B1Methods for repair of photomasksIBM·Filed 2000·Granted Feb 20, 2001·75 cites·18 claims
- 0294US5300786AOptical focus phase shift test pattern, monitoring system and processIBM·Filed 1992·Granted Apr 5, 1994·202 cites·30 claims
- 0393US6368881B1Wafer thickness control during backside grindIBM·Filed 2000·Granted Apr 9, 2002·54 cites·28 claims
- 0492US6165649AMethods for repair of photomasksIBM·Filed 1997·Granted Dec 26, 2000·70 cites·64 claims
- 0592US6090507AMethods for repair of photomasksIBM·Filed 1999·Granted Jul 18, 2000·76 cites·18 claims
- 0691US8271910B2EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layerTIRAPU-AZPIROZ JAIONE·Filed 2010·Granted Sep 18, 2012·9 cites·13 claims
- 0788US6731378B2Pellicle distortion reductionIBM·Filed 2002·Granted May 4, 2004·26 cites·10 claims
- 0888US6627361B2Assist features for contact hole mask patternsIBM·Filed 2001·Granted Sep 30, 2003·29 cites·17 claims
- 0988US6156461AMethod for repair of photomasksIBM·Filed 2000·Granted Dec 5, 2000·26 cites·11 claims
- 1087US7239376B2Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devicesIBM·Filed 2005·Granted Jul 3, 2007·10 cites·7 claims
- 1185US6887126B2Wafer thickness control during backside grindIBM·Filed 2001·Granted May 3, 2005·25 cites·14 claims
- 1285US5508803AMethod and apparatus for monitoring lithographic exposureIBM·Filed 1994·Granted Apr 16, 1996·66 cites·11 claims
- 1383US5955222AMethod of making a rim-type phase-shift mask and mask manufactured therebyIBM·Filed 1996·Granted Sep 21, 1999·51 cites·26 claims
- 1482US6096458AMethods for manufacturing photolithography masks utilizing interfering beams of radiationIBM·Filed 1998·Granted Aug 1, 2000·47 cites·30 claims
- 1578US7257247B2Mask defect analysis systemIBM·Filed 2002·Granted Aug 14, 2007·13 cites·27 claims
- 1676US7492941B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·3 cites·23 claims
- 1775US6653027B2Attenuated embedded phase shift photomask blanksIBM·Filed 2001·Granted Nov 25, 2003·12 cites·41 claims
- 1872US7492940B2Mask defect analysis systemIBM·Filed 2007·Granted Feb 17, 2009·2 cites·12 claims
- 1971US5614990AIllumination tailoring system using photochromic filterIBM·Filed 1994·Granted Mar 25, 1997·34 cites·31 claims
- 2070US6834548B1Method and apparatus for reduction of high-frequency vibrations in thick pelliclesIBM·Filed 2003·Granted Dec 28, 2004·8 cites·29 claims
- 2169US6730445B2Attenuated embedded phase shift photomask blanksIBM·Filed 2002·Granted May 4, 2004·8 cites·21 claims
- 2268US8110321B2Method of manufacture of damascene reticlePETRARCA KEVIN S·Filed 2007·Granted Feb 7, 2012·2 cites·20 claims
- 2368US6582857B1Repair of masks to promote adhesion of patchesIBM·Filed 2000·Granted Jun 24, 2003·11 cites·23 claims
- 2467US5552718AElectrical test structure and method for space and line measurementIBM·Filed 1995·Granted Sep 3, 1996·29 cites·20 claims
- 2565US7742632B2Alternating phase shift mask inspection using biased inspection dataIBM·Filed 2006·Granted Jun 22, 2010·2 cites·17 claims
- 2665US7416820B2Pellicle film optimized for immersion lithography systems with NA>1IBM·Filed 2007·Granted Aug 26, 2008·1 cites·14 claims
- 2765US5973771APupil imaging reticle for photo steppersIBM·Filed 1997·Granted Oct 26, 1999·29 cites·18 claims
- 2864US6858357B2Attenuated embedded phase shift photomask blanksIBM·Filed 2003·Granted Feb 22, 2005·5 cites·47 claims
- 2964US6682860B2Attenuated embedded phase shift photomask blanksIBM·Filed 2002·Granted Jan 27, 2004·7 cites·23 claims
- 3060US6110624AMultiple polarity mask exposure methodIBM·Filed 1999·Granted Aug 29, 2000·21 cites·39 claims
- 3159US8815475B2Reticle carrierIBM·Filed 2013·Granted Aug 26, 2014·0 cites·7 claims
- 3259US6835502B2In-situ pellicle monitorIBM·Filed 2002·Granted Dec 28, 2004·4 cites·15 claims
- 3357US6950183B2Apparatus and method for inspection of photolithographic maskIBM·Filed 2003·Granted Sep 27, 2005·1 cites·15 claims
- 3456US6824932B2Self-aligned alternating phase shift mask patterning processIBM·Filed 2002·Granted Nov 30, 2004·4 cites·4 claims
- 3556US6284443B1Method and apparatus for image adjustmentIBM·Filed 1999·Granted Sep 4, 2001·19 cites·24 claims
- 3656US6122056ADirect phase shift measurement between interference patterns using aerial image measurement toolIBM·Filed 1998·Granted Sep 19, 2000·15 cites·26 claims
- 3752US8439728B2Reticle carrierPETRARCA KEVIN S·Filed 2011·Granted May 14, 2013·0 cites·13 claims
- 3851US7642016B2Phase calibration for attenuating phase-shift masksIBM·Filed 2006·Granted Jan 5, 2010·0 cites·16 claims
- 3951US7134933B2Wafer thickness control during backside grindIBM·Filed 2005·Granted Nov 14, 2006·0 cites·8 claims
- 4050US7061590B2Pellicle distortion reductionIBM·Filed 2003·Granted Jun 13, 2006·1 cites·10 claims
- 4149US6979518B2Attenuated embedded phase shift photomask blanksIBM·Filed 2003·Granted Dec 27, 2005·0 cites·21 claims
- 4248US7060403B2In-situ pellicle monitorIBM·Filed 2004·Granted Jun 13, 2006·1 cites·5 claims
- 4342US2014297223A1Method for using optical metrology to monitor critical dimension uniformityIBM·Filed 2013·Application pending·0 cites
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