Inventor
YUKAWA HIROTO
JP14 patents
Patents
14 patentsUS6153733ANov 28, 2000
(Disulfonyl diazomethane compounds)
TOKYO OHKA KOGYO CO LTD254 citations96
US6180313B1Jan 30, 2001
Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same
TOKYO OHKA KOGYO CO LTD45 citations93
US6387587B1May 14, 2002
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD22 citations92
US6340553B1Jan 22, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD26 citations92
US6255041B1Jul 3, 2001
Method for formation of patterned resist layer
TOKYO OHKA KOGYO CO LTD16 citations83
US6284430B1Sep 4, 2001
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same
TOKYO OHKA KOGYO CO LTD8 citations73
US6890697B2May 10, 2005
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6869745B2Mar 22, 2005
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6815144B2Nov 9, 2004
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6485887B2Nov 26, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD4 citations62
US6649322B2Nov 18, 2003
Positive resist composition and positive resist base material using the same
TOKYO OHKA KOGYO CO LTD6 citations61
US7147984B2Dec 12, 2006
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations57
US6773863B2Aug 10, 2004
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations51
US6548229B2Apr 15, 2003
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same
TOKYO OHKA KOGYO CO LTD0 citations51