Inventor
LEE JUNG-YOUL
KR12 patents
⚠️ This page may combine multiple inventors who share the name “LEE JUNG-YOUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
DONGJIN SEMICHEM CO LTD
8 patentsUS9416296B2Aug 16, 2016
Resist underlayer composition and method for forming pattern using same
DONGJIN SEMICHEM CO LTD3 citations71
US7935474B2May 3, 2011
Acid-amplifier having acetal group and photoresist composition including the same
DONGJIN SEMICHEM CO LTD2 citations60
US7604919B2Oct 20, 2009
Monomer, polymer and composition for photoresist
DONGJIN SEMICHEM CO LTD2 citations60
US7569325B2Aug 4, 2009
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
DONGJIN SEMICHEM CO LTD3 citations60
US7501222B2Mar 10, 2009
Photoresist monomer polymer thereof and photoresist composition including the same
DONGJIN SEMICHEM CO LTD0 citations51
US7695893B2Apr 13, 2010
Photo-sensitive compound and photoresist composition including the same
DONGJIN SEMICHEM CO LTD1 citations49
US7419761B2Sep 2, 2008
Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
DONGJIN SEMICHEM CO LTD0 citations48
US9651867B2May 16, 2017
Compound and composition for forming lower film of resist pattern, and method for forming lower film using same
DONGJIN SEMICHEM CO LTD1 citations47
SAMSUNG ELECTRONICS CO LTD
2 patentsUS12046464B2Jul 23, 2024
Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations56
US10712662B2Jul 14, 2020
Methods of forming patterns using compositions for an underlayer of photoresist
SAMSUNG ELECTRONICS CO LTD0 citations36