Inventor · disambiguated record
Kristen Scheer
Also filed as: SCHEER KRISTEN · SCHEER KRISTEN C · SCHEER KRISTEN COLLEEN
7 granted patents·141 citations·filing 2003–2005
85Inventor score
Top patents by PatentIndex Score
7 records- 0194US6930060B2Method for forming a uniform distribution of nitrogen in silicon oxynitride gate dielectricIBM·Filed 2003·Granted Aug 16, 2005·90 cites·20 claims
- 0278US6974779B2Interfacial oxidation process for high-k gate dielectric process integrationIBM·Filed 2003·Granted Dec 13, 2005·20 cites·33 claims
- 0373US7160771B2Forming gate oxides having multiple thicknessesIBM·Filed 2003·Granted Jan 9, 2007·20 cites·7 claims
- 0465US7501352B2Method and system for forming an oxynitride layerTOKYO ELECTRON LTD·Filed 2005·Granted Mar 10, 2009·3 cites·163 claims
- 0559US7517814B2Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrentlyTOKYO ELECTRON LTD·Filed 2005·Granted Apr 14, 2009·2 cites·37 claims
- 0654US7235440B2Formation of ultra-thin oxide layers by self-limiting interfacial oxidationIBM·Filed 2003·Granted Jun 26, 2007·5 cites·12 claims
- 0745US7202186B2Method of forming uniform ultra-thin oxynitride layersIBM·Filed 2003·Granted Apr 10, 2007·1 cites·30 claims
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