Inventor · disambiguated record
Hiroie Matsumoto
Also filed as: MATSUMOTO HIROIE
4 granted patents·1 pending application·9 citations·filing 2013–2021
66Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD5
Top patents by PatentIndex Score
5 records- 0187US9607834B2Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)TOKYO ELECTRON LTD·Filed 2016·Granted Mar 28, 2017·5 cites·20 claims
- 0286US9818610B2Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)TOKYO ELECTRON LTD·Filed 2017·Granted Nov 14, 2017·4 cites·7 claims
- 0351US11710644B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 25, 2023·0 cites·17 claims
- 0450US9099285B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Aug 4, 2015·0 cites·5 claims
- 0542US2015287618A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →