P

Inventor

CLARK ROBERT

US67 patents
⚠️ This page may combine multiple inventors who share the name “CLARK ROBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

23 patents
US11101173B2Aug 24, 2021

Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same

TOKYO ELECTRON LTD11 citations94
US10916472B2Feb 9, 2021

Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same

TOKYO ELECTRON LTD14 citations94
US11456212B2Sep 27, 2022

Platform and method of operating for integrated end-to-end fully self-aligned interconnect process

TOKYO ELECTRON LTD4 citations84
US10784175B2Sep 22, 2020

Platform and method of operating for integrated end-to-end gate contact process

TOKYO ELECTRON LTD6 citations84
US10727057B2Jul 28, 2020

Platform and method of operating for integrated end-to-end self-aligned multi-patterning process

TOKYO ELECTRON LTD10 citations83
US10861744B2Dec 8, 2020

Platform and method of operating for integrated end-to-end CMP-less interconnect process

TOKYO ELECTRON LTD7 citations82
US11424236B2Aug 23, 2022

Facilitating alignment of stacked chiplets

TOKYO ELECTRON LTD2 citations73
US10964608B2Mar 30, 2021

Platform and method of operating for integrated end-to-end gate contact process

TOKYO ELECTRON LTD2 citations73
US10886173B2Jan 5, 2021

Platform and method of operating for integrated end-to-end fully self-aligned interconnect process

TOKYO ELECTRON LTD2 citations73
US11024535B2Jun 1, 2021

Method for filling recessed features in semiconductor devices with a low-resistivity metal

TOKYO ELECTRON LTD4 citations71
US12372871B2Jul 29, 2025

EUV active films for EUV lithography

TOKYO ELECTRON LTD0 citations63
US12191297B2Jan 7, 2025

Facilitating alignment of stacked chiplets

TOKYO ELECTRON LTD0 citations63
US11769677B2Sep 26, 2023

Substrate processing tool with integrated metrology and method of using

TOKYO ELECTRON LTD0 citations63
US11462414B2Oct 4, 2022

Atomic layer etching of metal oxides

TOKYO ELECTRON LTD0 citations63
US11264254B2Mar 1, 2022

Substrate processing tool with integrated metrology and method of using

TOKYO ELECTRON LTD0 citations63
US11764113B2Sep 19, 2023

Method of 3D logic fabrication to sequentially decrease processing temperature and maintain material thermal thresholds

TOKYO ELECTRON LTD1 citations62
US11594451B2Feb 28, 2023

Platform and method of operating for integrated end-to-end fully self-aligned interconnect process

TOKYO ELECTRON LTD0 citations62
US11398379B2Jul 26, 2022

Platform and method of operating for integrated end-to-end self-aligned multi-patterning process

TOKYO ELECTRON LTD0 citations62
US10923394B2Feb 16, 2021

Platform and method of operating for integrated end-to-end fully self-aligned interconnect process

TOKYO ELECTRON LTD0 citations62
US11621190B2Apr 4, 2023

Method for filling recessed features in semiconductor devices with a low-resistivity metal

TOKYO ELECTRON LTD0 citations61
US11894240B2Feb 6, 2024

Semiconductor processing systems with in-situ electrical bias

TOKYO ELECTRON LTD0 citations59
US11302588B2Apr 12, 2022

Platform and method of operating for integrated end-to-end area-selective deposition process

TOKYO ELECTRON LTD1 citations58
US11152268B2Oct 19, 2021

Platform and method of operating for integrated end-to-end area-selective deposition process

TOKYO ELECTRON LTD0 citations58

GOOGLE LLC

4 patents

CLARK ROBERT

3 patents

ORACLE INT CORP

3 patents

LEGENT CORP

2 patents

GENMARK DIAGNOSTICS INC

2 patents

SMITHKLINE BEECHAM CORP

2 patents

TOASTMASTER INC

1 patent

MULTI ARC VACUUM SYST

1 patent

ROSSLYN PREC LTD

1 patent

CONAX FLORIDA CORP

1 patent

BUCHANAN KRISTOPHER

1 patent

(unassigned)

1 patent

SKIVIEZ INC

1 patent

PARKEL YVONNE

1 patent

REDLINE INNOVATIONS INC

1 patent

GEORGIA TECH RES INST

1 patent

DAKO DENMARK AS

1 patent

Showing the top 50 of 67 patents by PatentIndex Score.