Inventor
PAN JAMES N
US20 patents
⚠️ This page may combine multiple inventors who share the name “PAN JAMES N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
18 patentsUS7138302B2Nov 21, 2006
Method of fabricating an integrated circuit channel region
ADVANCED MICRO DEVICES INC70 citations98
US7078299B2Jul 18, 2006
Formation of finFET using a sidewall epitaxial layer
ADVANCED MICRO DEVICES INC118 citations98
US6855982B1Feb 15, 2005
Self aligned double gate transistor having a strained channel region and process therefor
ADVANCED MICRO DEVICES INC103 citations98
US6955969B2Oct 18, 2005
Method of growing as a channel region to reduce source/drain junction capacitance
ADVANCED MICRO DEVICES INC89 citations97
US6943087B1Sep 13, 2005
Semiconductor on insulator MOSFET having strained silicon channel
ADVANCED MICRO DEVICES INC59 citations96
US6929992B1Aug 16, 2005
Strained silicon MOSFETs having NMOS gates with work functions for compensating NMOS threshold voltage shift
ADVANCED MICRO DEVICES INC78 citations96
US6727560B1Apr 27, 2004
Engineered metal gate electrode
ADVANCED MICRO DEVICES INC64 citations96
US7033869B1Apr 25, 2006
Strained silicon semiconductor on insulator MOSFET
ADVANCED MICRO DEVICES INC48 citations92
US7033888B2Apr 25, 2006
Engineered metal gate electrode
ADVANCED MICRO DEVICES INC33 citations92
US6936516B1Aug 30, 2005
Replacement gate strained silicon finFET process
ADVANCED MICRO DEVICES INC38 citations92
US6900143B1May 31, 2005
Strained silicon MOSFETs having improved thermal dissipation
ADVANCED MICRO DEVICES INC18 citations84
US6893910B1May 17, 2005
One step deposition method for high-k dielectric and metal gate electrode
ADVANCED MICRO DEVICES INC15 citations84
US7462549B2Dec 9, 2008
Shallow trench isolation process and structure with minimized strained silicon consumption
ADVANCED MICRO DEVICES INC5 citations74
US6861325B1Mar 1, 2005
Methods for fabricating CMOS-compatible lateral bipolar junction transistors
ADVANCED MICRO DEVICES INC9 citations74
US7074657B2Jul 11, 2006
Low-power multiple-channel fully depleted quantum well CMOSFETs
ADVANCED MICRO DEVICES INC5 citations73
US7045384B1May 16, 2006
Method for determining metal work function by formation of Schottky diodes with shadow mask
ADVANCED MICRO DEVICES INC4 citations63
US7253484B2Aug 7, 2007
Low-power multiple-channel fully depleted quantum well CMOSFETs
ADVANCED MICRO DEVICES INC2 citations62
US8753943B2Jun 17, 2014
Replacement metal gate transistors with reduced gate oxide leakage
ADVANCED MICRO DEVICES INC0 citations51