P

Inventor

PAN JAMES N

US20 patents
⚠️ This page may combine multiple inventors who share the name “PAN JAMES N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

18 patents
US7138302B2Nov 21, 2006

Method of fabricating an integrated circuit channel region

ADVANCED MICRO DEVICES INC70 citations98
US7078299B2Jul 18, 2006

Formation of finFET using a sidewall epitaxial layer

ADVANCED MICRO DEVICES INC118 citations98
US6855982B1Feb 15, 2005

Self aligned double gate transistor having a strained channel region and process therefor

ADVANCED MICRO DEVICES INC103 citations98
US6955969B2Oct 18, 2005

Method of growing as a channel region to reduce source/drain junction capacitance

ADVANCED MICRO DEVICES INC89 citations97
US6943087B1Sep 13, 2005

Semiconductor on insulator MOSFET having strained silicon channel

ADVANCED MICRO DEVICES INC59 citations96
US6929992B1Aug 16, 2005

Strained silicon MOSFETs having NMOS gates with work functions for compensating NMOS threshold voltage shift

ADVANCED MICRO DEVICES INC78 citations96
US6727560B1Apr 27, 2004

Engineered metal gate electrode

ADVANCED MICRO DEVICES INC64 citations96
US7033869B1Apr 25, 2006

Strained silicon semiconductor on insulator MOSFET

ADVANCED MICRO DEVICES INC48 citations92
US7033888B2Apr 25, 2006

Engineered metal gate electrode

ADVANCED MICRO DEVICES INC33 citations92
US6936516B1Aug 30, 2005

Replacement gate strained silicon finFET process

ADVANCED MICRO DEVICES INC38 citations92
US6900143B1May 31, 2005

Strained silicon MOSFETs having improved thermal dissipation

ADVANCED MICRO DEVICES INC18 citations84
US6893910B1May 17, 2005

One step deposition method for high-k dielectric and metal gate electrode

ADVANCED MICRO DEVICES INC15 citations84
US7462549B2Dec 9, 2008

Shallow trench isolation process and structure with minimized strained silicon consumption

ADVANCED MICRO DEVICES INC5 citations74
US6861325B1Mar 1, 2005

Methods for fabricating CMOS-compatible lateral bipolar junction transistors

ADVANCED MICRO DEVICES INC9 citations74
US7074657B2Jul 11, 2006

Low-power multiple-channel fully depleted quantum well CMOSFETs

ADVANCED MICRO DEVICES INC5 citations73
US7045384B1May 16, 2006

Method for determining metal work function by formation of Schottky diodes with shadow mask

ADVANCED MICRO DEVICES INC4 citations63
US7253484B2Aug 7, 2007

Low-power multiple-channel fully depleted quantum well CMOSFETs

ADVANCED MICRO DEVICES INC2 citations62
US8753943B2Jun 17, 2014

Replacement metal gate transistors with reduced gate oxide leakage

ADVANCED MICRO DEVICES INC0 citations51

PAN JAMES N

1 patent

GLOBALFOUNDRIES INC

1 patent