Inventor · disambiguated record
Hirotoshi Fujie
Also filed as: FUJIE HIROTOSHI
13 granted patents·574 citations·filing 1991–2002
94Inventor score
Top patents by PatentIndex Score
13 records- 0197US5350660AChemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphereWAKO PURE CHEM IND LTD·Filed 1991·Granted Sep 27, 1994·210 cites·19 claims
- 0285US6432608B1Resist compositionWAKO PURE CHEM IND LTD·Filed 2000·Granted Aug 13, 2002·23 cites·23 claims
- 0383US6656660B1Resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Dec 2, 2003·56 cites·2 claims
- 0481US5468589AResist material and pattern formation processWAKO PURE CHEM IND LTD·Filed 1992·Granted Nov 21, 1995·72 cites·10 claims
- 0576US5670299APattern formation processWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 23, 1997·47 cites·18 claims
- 0676US5216135ADiazodisulfonesWAKO PURE CHEM IND LTD·Filed 1992·Granted Jun 1, 1993·25 cites·7 claims
- 0773US6033826APolymer and resist materialWAKO PURE CHEM IND LTD·Filed 1996·Granted Mar 7, 2000·33 cites·11 claims
- 0873US5976759APolymer composition and resist materialWAKO PURE CHEM IND LTD·Filed 1996·Granted Nov 2, 1999·44 cites·31 claims
- 0966US6716573B2Resist CompositionWAKO PURE CHEM IND LTD·Filed 2002·Granted Apr 6, 2004·7 cites·9 claims
- 1065US6335143B1Resist composition containing specific cross-linking agentWAKO PURE CHEM IND LTD·Filed 1998·Granted Jan 1, 2002·24 cites·20 claims
- 1162US5627006AResist materialWAKO PURE CHEM IND LTD·Filed 1995·Granted May 6, 1997·22 cites·14 claims
- 1240USRE40211EDiazodisulfonesWAKO PURE CHEM IND LTD·Filed 2001·Granted Apr 1, 2008·0 cites·7 claims
- 1340US6303264B1Agent for reducing the substrate dependence of resistWAKO PURE CHEM IND LTD·Filed 1998·Granted Oct 16, 2001·11 cites·40 claims
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