Inventor
OONO KEIJI
JP14 patents
Patents
14 patentsUS5350660ASep 27, 1994
Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere
WAKO PURE CHEM IND LTD210 citations98
US6723483B1Apr 20, 2004
Sulfonium salt compounds
WAKO PURE CHEM IND LTD65 citations95
US5670299ASep 23, 1997
Pattern formation process
WAKO PURE CHEM IND LTD47 citations95
US5468589ANov 21, 1995
Resist material and pattern formation process
WAKO PURE CHEM IND LTD72 citations95
US6033826AMar 7, 2000
Polymer and resist material
WAKO PURE CHEM IND LTD33 citations92
US5976759ANov 2, 1999
Polymer composition and resist material
WAKO PURE CHEM IND LTD44 citations92
US5677112AOct 14, 1997
Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition
WAKO PURE CHEM IND LTD44 citations92
US5627006AMay 6, 1997
Resist material
WAKO PURE CHEM IND LTD22 citations92
US5576359ANov 19, 1996
Deep ultraviolet absorbent composition
WAKO PURE CHEM IND LTD23 citations92
US5498748AMar 12, 1996
Anthracene derivatives
WAKO PURE CHEM IND LTD23 citations92
US5216135AJun 1, 1993
Diazodisulfones
WAKO PURE CHEM IND LTD25 citations92
US7618914B2Nov 17, 2009
Method for producing hydroxylamine compound using platinum catalyst fixed on ion-exchange resin
WAKO PURE CHEM IND LTD4 citations59
USRE40211EApr 1, 2008
Diazodisulfones
WAKO PURE CHEM IND LTD0 citations51
US7741242B2Jun 22, 2010
Palladium catalyst composition
WAKO PURE CHEM IND LTD0 citations41