Inventor

FINAROV MOSHE

IL87 patents

⚠️ This page may combine multiple inventors who share the name “FINAROV MOSHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FINAROV MOSHE

NOVA MEASURING INSTR LTD

Lateral shift measurement using an optical technique

Method and system for measuring patterned structures

Autofocussing microscope having a pattern imaging system

Device for measuring the thickness of thin films

Monitoring apparatus and method particularly useful in photolithographically processing substrates

Method and apparatus for measurements of patterned structures

Method and apparatus for alignment of a wafer

Two-dimensional beam deflector

Method and system for measuring patterned structures

Monitoring apparatus and method particularly useful in photolithographically processing substrates

Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof

Method and system for controlling the photolithography process

Method and apparatus for measurements of patterned structures

Monitoring apparatus and method particularly useful in photolithographically processing substrates

Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects

Method and system for measuring patterned structures

Method and system for measuring patterned structures

Method and system for measuring patterned structures

Method and system for endpoint detection

Method and system for thin film characterization

Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereof

Method and system for endpoint detection

Method and system for measuring in patterned structures

Two-dimensional beam deflector

Apparatus for optical inspection of wafers during polishing

Lateral shift measurement using an optical technique

Optical system operating with variable angle of incidence

Monitoring apparatus and method particularly useful in photolithographically processing substrates

Method and system for controlling the photolithography process

Thin films measurement method and system

Optical inspection system and method

Apparatus for optical inspection of wafers during polishing

Two-dimensional beam deflector

Method and apparatus for process control in semiconductor manufacture

Method and system for overlay measurement

Monitoring apparatus and method particularly useful in photolithographically processing substrates

Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects

Lateral shift measurement using an optical technique

Monitoring apparatus and method particularly useful in photolithographically

Method and system for measuring patterned structures

Method and system for endpoint detection

Method and system for measuring patterned structures

Method and system for measuring patterned structures

Method and system for measuring patterned structures

Method and system for endpoint detection

Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof

ORBOTECH LTD

Method and apparatus for automatic optical inspection

Apparatus and method for optical inspection of articles

FINAROV MOSHE

Method and system for measuring patterned structures

MATUSOVSKY MIKHAEL

Light induced patterning