Inventor · disambiguated record
Vaidyanathan Balasubramaniam
Also filed as: BALASUBRAMANIAM VAIDYANATHAN
13 granted patents·3 pending applications·167 citations·filing 2000–2009
92Inventor score
Technology areasH10P
Top patents by PatentIndex Score
16 records- 0193US7344993B2Low-pressure removal of photoresist and etch residueTOKYO ELECTRON LTD INC·Filed 2005·Granted Mar 18, 2008·39 cites·43 claims
- 0290US7595005B2Method and apparatus for ashing a substrate using carbon dioxideTOKYO ELECTRON LTD·Filed 2006·Granted Sep 29, 2009·17 cites·20 claims
- 0386US7169440B2Method for removing photoresist and etch residuesTOKYO ELECTRON LTD·Filed 2002·Granted Jan 30, 2007·38 cites·38 claims
- 0482US8252192B2Method of pattern etching a dielectric film while removing a mask layerLEE YAO-SHENG·Filed 2009·Granted Aug 28, 2012·9 cites·20 claims
- 0575US6670276B1Plasma processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Dec 30, 2003·19 cites·3 claims
- 0670US7700494B2Low-pressure removal of photoresist and etch residueTOKYO ELECTRON LTD INC·Filed 2004·Granted Apr 20, 2010·14 cites·45 claims
- 0769US7998872B2Method for etching a silicon-containing ARC layer to reduce roughness and CDTOKYO ELECTRON LTD·Filed 2008·Granted Aug 16, 2011·3 cites·21 claims
- 0865US7767926B2Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivationTOKYO ELECTRON LTD·Filed 2006·Granted Aug 3, 2010·2 cites·10 claims
- 0965US7759249B2Method of removing residue from a substrateTOKYO ELECTRON LTD·Filed 2006·Granted Jul 20, 2010·2 cites·21 claims
- 1065US6849559B2Method for removing photoresist and etch residuesTOKYO ELECTRON LTD·Filed 2002·Granted Feb 1, 2005·10 cites·38 claims
- 1158US7465673B2Method and apparatus for bilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2003·Granted Dec 16, 2008·7 cites·14 claims
- 1257US7344991B2Method and apparatus for multilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2003·Granted Mar 18, 2008·6 cites·7 claims
- 1354US8048325B2Method and apparatus for multilayer photoresist dry developmentTOKYO ELECTRON LTD·Filed 2008·Granted Nov 1, 2011·1 cites·7 claims
- 1448US2010216310A1Process for etching anti-reflective coating to improve roughness, selectivity and CD shrinkTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1538US2005136681A1Method and apparatus for removing photoresist from a substrateTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 1637US2005136666A1Method and apparatus for etching an organic layerIBM·Filed 2004·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →