Inventor
FUJIEDA NAGATOSHI
JP2 patents
Patents
2 patentsUS7932012B2Apr 26, 2011
Heat-resistant photosensitive resin composition, method for forming pattern using the composition, and electronic part
HITACHI CHEM DUPONT MICROSYS10 citations81
US7642018B2Jan 5, 2010
Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition
HITACHI CHEM DUPONT MICROSYS6 citations57