Inventor · disambiguated record
Melisa Buie
Also filed as: BUIE MELISA · BUIE MELISA J
6 granted patents·4 pending applications·72 citations·filing 1996–2007
82Inventor score
Top patents by PatentIndex Score
10 records- 0191US7250309B2Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process controlAPPLIED MATERIALS INC·Filed 2004·Granted Jul 31, 2007·39 cites·19 claims
- 0267US6649075B1Method and apparatus for measuring etch uniformity of a semiconductor waferAPPLIED MATERIALS INC·Filed 1996·Granted Nov 18, 2003·22 cites·6 claims
- 0362US6960413B2Multi-step process for etching photomasksAPPLIED MATERIALS INC·Filed 2004·Granted Nov 1, 2005·6 cites·30 claims
- 0461US7371485B2Multi-step process for etching photomasksAPPLIED MATERIALS INC·Filed 2005·Granted May 13, 2008·1 cites·19 claims
- 0551US2007296980A1Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process controlMAK ALFRED W·Filed 2007·Application pending·0 cites
- 0648US7115523B2Method and apparatus for etching photomasksAPPLIED MATERIALS INC·Filed 2003·Granted Oct 3, 2006·2 cites·19 claims
- 0747US7018934B2Methods and apparatus for etching metal layers on substratesAPPLIED MATERIALS INC·Filed 2002·Granted Mar 28, 2006·2 cites·26 claims
- 0846US2006163203A1Methods and apparatus for etching metal layers on substratesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 0935US2003003374A1Etch process for photolithographic reticle manufacturing with improved etch biasAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 1035US2004072081A1Methods for etching photolithographic reticlesFiled 2003·Application pending·0 cites
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