Inventor · disambiguated record
Wilhelmus Sebastianus Marcus Maria Ketelaars
Also filed as: KETELAARS WILHELMUS SEBASTIANU · KETELAARS WILHELMUS SEBASTIANUS MARCUS MARIA
9 granted patents·1 pending application·69 citations·filing 2002–2013
85Inventor score
Files withASML NETHERLANDS BV4KONINKL PHILIPS ELECTRONICS NV2BOOGAARD ARJEN1BRIZARD AURELIE MARIE ANDREE1PEETERS EMIEL1
Top patents by PatentIndex Score
10 records- 0193US7450217B2Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Nov 11, 2008·16 cites·18 claims
- 0283US7119353B2Electric device with phase change material and method of manufacturing the sameKONINKL PHILIPS ELECTRONICS NV·Filed 2003·Granted Oct 10, 2006·27 cites·8 claims
- 0379US9235125B2Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithographyASML NETHERLANDS BV·Filed 2013·Granted Jan 12, 2016·4 cites·20 claims
- 0478US7746375B2Digital camera with panorama or mosaic functionalityKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Jun 29, 2010·18 cites·11 claims
- 0568US9285676B2Self-assemblable polymer and method for use in lithographyBRIZARD AURELIE MARIE ANDREE·Filed 2012·Granted Mar 15, 2016·2 cites·21 claims
- 0664US10538859B2Methods for providing patterned orientation templates for self-assemblable polymers for use in device lithographyPEETERS EMIEL·Filed 2011·Granted Jan 21, 2020·1 cites·16 claims
- 0759US10240250B2Method to provide a patterned orientation template for a self-assemblable polymerASML NETHERLANDS BV·Filed 2012·Granted Mar 26, 2019·1 cites·23 claims
- 0858US8830446B2Exposure apparatusASML NETHERLANDS BV·Filed 2013·Granted Sep 9, 2014·0 cites·22 claims
- 0951US8542341B2Exposure apparatusBOOGAARD ARJEN·Filed 2008·Granted Sep 24, 2013·0 cites·19 claims
- 1033US2003150737A1Method of forming a pattern of sub-micron broad featuresFiled 2002·Application pending·0 cites
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