Inventor

LIU SHENJIAN

US18 patents

⚠️ This page may combine multiple inventors who share the name “LIU SHENJIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIU SHENJIAN

LAM RES CORP

Method for reducing microloading in etching high aspect ratio structures

Tungsten silicide etch process with reduced etch rate micro-loading

Line width roughness improvement with noble gas plasma

Line width roughness improvement with noble gas plasma

Residual halogen reduction with microwave stripper

Phase change alloy etch

Method for selectively etching an aluminum containing layer

LEE WONCHUL

Pulsed bias plasma process to control microloading

Method of controlling etch microloading for a tungsten-containing layer

SHIH HONG

Extending lifetime of yttrium oxide as a plasma chamber material

Extending lifetime of yttrium oxide as a plasma chamber material

ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA

Plasma process apparatus with low particle contamination and method of operating the same

Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus

CHENG SHIH-YUAN

Line width roughness improvement with noble gas plasma

KAMP TOM

Plasma etch method to reduce micro-loading

ADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI

Plasma reactor having a variable coupling of low frequency RF power to an annular electrode

MIKHAYLICHENKO KATRINA

Method and apparatus for pattern collapse free wet processing of semiconductor devices

BAE IN DEOG

Selective etch of high-k dielectric material