Inventor

CHEN MING-JUI

TW44 patents

⚠️ This page may combine multiple inventors who share the name “CHEN MING-JUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN MING-JUI

UNITED MICROELECTRONICS CORP

Method of optical proximity correction

Method for optical proximity correction

Method of optical proximity correction in combination with double patterning technique

Method for making photomask layout

Static random access memory layout structure

Semiconductor structure and method of forming the same

Method for decomposing a layout of an integrated circuit

Mask set for double exposure process and method of using the mask set

Method of optical proximity correction

Pattern verifying method

Semiconductor structure and method for fabricating semiconductor layout

Method for separating photomask pattern

Double patterning mask set and method of forming thereof

Semiconductor device with a single diffusion break structure and a gate structure having aligned sidewalls

Method for fabricating a fin with minimal length between two single-diffusion break (SDB) trenches

Semiconductor device with a single diffusion break structure having a sidewall aligned with a gate sidewall

Lithography method

Method for inspecting photo-mask

Method for generating layout pattern

Method for generating layout pattern

Chrome-less mask inspection method

Static random access memory unit structure

Semiconductor integrated circuit layout structure

Method of forming semiconductor structure

Semiconductor integrated circuit layout structure

Method for making photomask layout

Method for optimizing an integrated circuit layout design

Phase shift mask

Method for forming a semiconductor structure

Method for forming photo-mask and OPC method

Integrated FinFET structure having a contact plug pitch larger than fin and first metal pitch

Method and apparatus for integrated circuit design

Method for patterning semiconductor structure

HUANG CHUN-HSIEN

Method to compensate optical proximity correction

Method to compensate optical proximity correction

Method for designing stressor pattern

HUANG CHIA-WEI

Semiconductor structure formed by double patterning technique

Optical proximity correction method

HSIEH TE-HSIEN

Mask pattern and correcting method thereof

Method of optical proximity correction according to complexity of mask pattern

UNITED MICROELECTRONIC CORP

Contact hole model-based optical proximity correction method

KUO HUI-FANG

Mask set for double exposure process and method of using the mask set

YANG YU-SHIANG

Method and computer-readable medium of optical proximity correction

LO WEI-CYUAN

Mask inspecting method