Inventor

HSIEH TE-HSIEN

TW18 patents

⚠️ This page may combine multiple inventors who share the name “HSIEH TE-HSIEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HSIEH TE-HSIEN

TAIWAN SEMICONDUCTOR MFG CO LTD

3D RRAM cell structure for reducing forming and set voltages

Via landing on first and second barrier layers to reduce cleaning time of conductive structure

Ion beam etching chamber with etching by-product redistributor

Ion beam etching chamber with etching by-product redistributor

Channel pattern design to improve carrier transfer efficiency

Via landing on first and second barrier layers to reduce cleaning time of conductive structure

3D RRAM cell structure for reducing forming and set voltages

Ion beam etching chamber with etching by-product redistributor

High density memory devices with low cell leakage and methods for forming the same

UNITED MICROELECTRONICS CORP

Method of optical proximity correction

Pattern verifying method

Double patterning mask set and method of forming thereof

Method for making photomask layout

Method for optimizing an integrated circuit layout design

Method and apparatus for integrated circuit design

HSIEH TE-HSIEN

Mask pattern and correcting method thereof

Optical proximity correction process

Method of optical proximity correction according to complexity of mask pattern