Inventor
LEE JING-YI
TW14 patents
⚠️ This page may combine multiple inventors who share the name “LEE JING-YI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
7 patentsUS9047658B2Jun 2, 2015
Method of optical proximity correction
UNITED MICROELECTRONICS CORP4 citations71
US9785046B2Oct 10, 2017
Pattern verifying method
UNITED MICROELECTRONICS CORP4 citations67
US8383299B2Feb 26, 2013
Double patterning mask set and method of forming thereof
UNITED MICROELECTRONICS CORP3 citations60
US8745547B1Jun 3, 2014
Method for making photomask layout
UNITED MICROELECTRONICS CORP0 citations50
US9747404B2Aug 29, 2017
Method for optimizing an integrated circuit layout design
UNITED MICROELECTRONICS CORP0 citations48
US9262820B2Feb 16, 2016
Method and apparatus for integrated circuit design
UNITED MICROELECTRONICS CORP0 citations40
US10474026B2Nov 12, 2019
Method for correcting bevel corners of a layout pattern
UNITED MICROELECTRONICS CORP0 citations35
TWI BIOTECHNOLOGY INC
4 patentsUS10512625B2Dec 24, 2019
Diacerein or rhein topical formulations and uses thereof
TWI BIOTECHNOLOGY INC0 citations47
US10195170B2Feb 5, 2019
Methods for inhibiting expression of ASC, expression of NLRP3, and/or formation of NLRP3 inflammasome complex using diacerein or its analogs
TWI BIOTECHNOLOGY INC0 citations47
US10154984B2Dec 18, 2018
Diacerein or Rhein topical formulations and uses thereof
TWI BIOTECHNOLOGY INC0 citations47
US9744131B2Aug 29, 2017
Diacerein or rhein topical formulations and uses thereof
TWI BIOTECHNOLOGY INC0 citations47
HSIEH TE-HSIEN
3 patentsUS8885917B2Nov 11, 2014
Mask pattern and correcting method thereof
HSIEH TE-HSIEN2 citations59
US8283093B2Oct 9, 2012
Optical proximity correction process
HSIEH TE-HSIEN2 citations58
US8806391B2Aug 12, 2014
Method of optical proximity correction according to complexity of mask pattern
HSIEH TE-HSIEN0 citations37