Inventor

RASHEED MUHAMMAD M

US55 patents

⚠️ This page may combine multiple inventors who share the name “RASHEED MUHAMMAD M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RASHEED MUHAMMAD M

APPLIED MATERIALS INC

Low resistivity tungsten PVD with enhanced ionization and RF power coupling

Gas distribution system for improved transient phase deposition

Multi-port pumping system for substrate processing chambers

Gas distribution assembly lid

Oxidized showerhead and process kit parts and methods of using same

Use of enhanced turbomolecular pump for gapfill deposition using high flows of low-mass fluent gas

Apparatus and method for providing a uniform flow of gas

Atomic layer deposition chamber with thermal lid

Showerhead for ALD precursor delivery

Compression fitting

Process kit for improving edge film thickness uniformity on a substrate

Apparatus for multi-flow precursor dosage

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

Process kit design for in-chamber heater and wafer rotating mechanism

Selectively groundable cover ring for substrate process chambers

Physical vapor deposition (PVD) target having low friction pads

Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate

Apparatus and method for providing a uniform flow of gas

Process kit for a substrate support

Quick disconnect resistance temperature detector assembly for rotating pedestal

High temperature vacuum seal

High temperature vacuum seal

Valve for varying flow conductance under vacuum

Gimbal assembly for heater pedestal

Heater cover plate for uniformity improvement

Process kit for a substrate support

High temperature chemical vapor deposition lid

Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery system

Heater cover plate for uniformity improvement

High temperature chemical vapor deposition lid

Thermal management of inductively coupled plasma reactors

Lower edge ring of a process kit for semiconductor substrate processing

Lower edge ring of a process kit for semiconductor substrate processing

Lids and lid assembly kits for atomic layer deposition chambers

Pumping liner for improved flow uniformity

Pumping liner for improved flow uniformity

Apparatus and methods to prevent particle entry into gas lines

High temperature rotation module for a processing chamber

Surface treated aluminum nitride baffle

Sputtering target for PVD chamber

Variable radius dual magnetron

Method and apparatus for excimer curing

ALD cycle time reduction using process chamber lid with tunable pumping

RASHEED MUHAMMAD M

Surface treated aluminum nitride baffle

PVD sputtering target with a protected backing plate

Ceramic cover wafers of aluminum nitride or beryllium oxide

Uniformity tuning capable ESC grounding kit for RF PVD chamber

Low profile process kit

CAO YONG

Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming

LIU ZHENDONG

Sputtering target for PVD chamber