Inventor

LEESER KARL FREDERICK

US31 patents

⚠️ This page may combine multiple inventors who share the name “LEESER KARL FREDERICK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEESER KARL FREDERICK

LAM RES CORP

RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks

Impedance transformation in radio-frequency-assisted plasma generation

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system

Closed-loop multiple-output radio frequency (RF) matching

Rotational indexer with additional rotational axes

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks

Processing tool capable for forming carbon layers on substrates

Distortion of pulses for wafer biasing

Mechanical suppression of parasitic plasma in substrate processing chamber

Mechanical suppression of parasitic plasma in substrate processing chamber

Rotational indexer with additional rotational axes

Mechanical suppression of parasitic plasma in substrate processing chamber

Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generator

Substrate processing system with tandem source activation for CVD

Impedance transformation in radio-frequency-assisted plasma generation

Anomalous plasma event detection and mitigation in semiconductor processing

Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system

Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Mechanical indexer for multi-station process module

Modular-component system for gas delivery

In situ protective coating of chamber components for semiconductor processing

Joining techniques for composite ceramic bodies

Differential-pressure-based flow meters

Lamellar ceramic structure

Process module chamber providing symmetric RF return path

NOVELLUS SYSTEMS INC

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region