Inventor
KAWADA HIROKI
JP64 patents
⚠️ This page may combine multiple inventors who share the name “KAWADA HIROKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
39 patentsUS7049589B2May 23, 2006
Pattern inspection method
HITACHI HIGH TECH CORP63 citations95
US9824938B2Nov 21, 2017
Charged particle beam device and inspection device
HITACHI HIGH TECH CORP20 citations93
US7366620B2Apr 29, 2008
Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication
HITACHI HIGH TECH CORP30 citations93
US7230723B2Jun 12, 2007
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP20 citations93
US7269287B2Sep 11, 2007
Method and apparatus for measuring dimension using electron microscope
HITACHI HIGH TECH CORP23 citations92
US7187345B2Mar 6, 2007
Image forming method and charged particle beam apparatus
HITACHI HIGH TECH CORP14 citations92
US8003940B2Aug 23, 2011
Tool-to-tool matching control method and its system for scanning electron microscope
HITACHI HIGH TECH CORP9 citations84
US7807980B2Oct 5, 2010
Charged particle beam apparatus and methods for capturing images using the same
HITACHI HIGH TECH CORP11 citations84
US7619751B2Nov 17, 2009
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP9 citations84
US7476857B2Jan 13, 2009
Tool-to-tool matching control method and its system for scanning electron microscope
HITACHI HIGH TECH CORP10 citations84
US7408154B2Aug 5, 2008
Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes
HITACHI HIGH TECH CORP12 citations84
US7408155B2Aug 5, 2008
Measuring method and its apparatus
HITACHI HIGH TECH CORP16 citations84
US7399964B2Jul 15, 2008
Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system
HITACHI HIGH TECH CORP11 citations84
US7285777B2Oct 23, 2007
Sample dimension measuring method and scanning electron microscope
HITACHI HIGH TECH CORP13 citations84
US7164127B2Jan 16, 2007
Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same
HITACHI HIGH TECH CORP16 citations84
US7817105B2Oct 19, 2010
Image forming method and charged particle beam apparatus
HITACHI HIGH TECH CORP9 citations83
US7460714B2Dec 2, 2008
Method and apparatus for measuring dimension using electron microscope
HITACHI HIGH TECH CORP10 citations83
US6995370B2Feb 7, 2006
Scanning electron microscope
HITACHI HIGH TECH CORP12 citations82
US7420168B2Sep 2, 2008
Scanning electron microscope and CD measurement calibration standard specimen
HITACHI HIGH TECH CORP8 citations74
US7405835B2Jul 29, 2008
High-accuracy pattern shape evaluating method and apparatus
HITACHI HIGH TECH CORP5 citations74
US7361898B2Apr 22, 2008
Scanning electron microscope and CD measurement calibration standard specimen
HITACHI HIGH TECH CORP8 citations74
US7154090B2Dec 26, 2006
Method for controlling charged particle beam, and charged particle beam apparatus
HITACHI HIGH TECH CORP9 citations74
US7045782B2May 16, 2006
Method of measurement accuracy improvement by control of pattern shrinkage
HITACHI HIGH TECH CORP9 citations74
US10184790B2Jan 22, 2019
Pattern measurement method and pattern measurement device
HITACHI HIGH TECH CORP6 citations73
US9658063B2May 23, 2017
Method and device for line pattern shape evaluation
HITACHI HIGH TECH CORP3 citations73
US10816333B2Oct 27, 2020
Pattern measurement method and pattern measurement device
HITACHI HIGH TECH CORP1 citations63
US8369602B2Feb 5, 2013
Length measurement system
HITACHI HIGH TECH CORP3 citations63
US7910886B2Mar 22, 2011
Sample dimension measuring method and scanning electron microscope
HITACHI HIGH TECH CORP6 citations63
US7511272B2Mar 31, 2009
Method for controlling charged particle beam, and charged particle beam apparatus
HITACHI HIGH TECH CORP2 citations63
US7817860B2Oct 19, 2010
Method and apparatus for measuring dimension using electron microscope
HITACHI HIGH TECH CORP3 citations62
US9305744B2Apr 5, 2016
Measuring method, data processing apparatus and electron microscope using same
HITACHI HIGH TECH CORP2 citations61
US7375329B2May 20, 2008
Scanning electron microscope
HITACHI HIGH TECH CORP2 citations61
US10002743B2Jun 19, 2018
Measurement system and measurement method
HITACHI HIGH TECH CORP1 citations52
US8362426B2Jan 29, 2013
Scanning electron microscope and image signal processing method
HITACHI HIGH TECH CORP1 citations52
US8022356B2Sep 20, 2011
Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope
HITACHI HIGH TECH CORP0 citations52
US7684937B2Mar 23, 2010
Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication
HITACHI HIGH TECH CORP0 citations52
US7605364B2Oct 20, 2009
Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope
HITACHI HIGH TECH CORP1 citations52
US7288763B2Oct 30, 2007
Method of measurement accuracy improvement by control of pattern shrinkage
HITACHI HIGH TECH CORP0 citations52
US10438771B2Oct 8, 2019
Measurement device, calibration method of measurement device, and calibration member
HITACHI HIGH TECH CORP0 citations51
HITACHI LTD
4 patentsUS5536359AJul 16, 1996
Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber
HITACHI LTD86 citations96
US7659508B2Feb 9, 2010
Method for measuring dimensions of sample and scanning electron microscope
HITACHI LTD11 citations84
US6288368B1Sep 11, 2001
Vacuum heating furnace with tapered portion
HITACHI LTD6 citations73
US6093911AJul 25, 2000
Vacuum heating furnace with tapered portion
HITACHI LTD2 citations62
KAWADA HIROKI
2 patentsUS9297649B2Mar 29, 2016
Pattern dimension measurement method and charged particle beam apparatus
KAWADA HIROKI3 citations71
US9702695B2Jul 11, 2017
Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof
KAWADA HIROKI5 citations70
NIPPON CATALYTIC CHEM IND
2 patentsYAMAGUCHI ATSUKO
1 patentSEKIGUCHI TOMOKO
1 patentOOSAKI MAYUKA
1 patentShowing the top 50 of 64 patents by PatentIndex Score.