P

Inventor

MAEDA TATSUYA

JP47 patents
⚠️ This page may combine multiple inventors who share the name “MAEDA TATSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI HIGH TECH CORP

13 patents
US7366620B2Apr 29, 2008

Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication

HITACHI HIGH TECH CORP30 citations93
US8003940B2Aug 23, 2011

Tool-to-tool matching control method and its system for scanning electron microscope

HITACHI HIGH TECH CORP9 citations84
US7807980B2Oct 5, 2010

Charged particle beam apparatus and methods for capturing images using the same

HITACHI HIGH TECH CORP11 citations84
US7545977B2Jun 9, 2009

Image processing apparatus for analysis of pattern matching failure

HITACHI HIGH TECH CORP10 citations84
US7476857B2Jan 13, 2009

Tool-to-tool matching control method and its system for scanning electron microscope

HITACHI HIGH TECH CORP10 citations84
US7408154B2Aug 5, 2008

Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes

HITACHI HIGH TECH CORP12 citations84
US8384030B2Feb 26, 2013

Method and apparatus for setting sample observation condition, and method and apparatus for sample observation

HITACHI HIGH TECH CORP3 citations63
US7446313B2Nov 4, 2008

Scanning electron microscope

HITACHI HIGH TECH CORP4 citations63
US7433542B2Oct 7, 2008

Method for measuring line and space pattern using scanning electron microscope

HITACHI HIGH TECH CORP2 citations63
US7372047B2May 13, 2008

Charged particle system and a method for measuring image magnification

HITACHI HIGH TECH CORP2 citations63
US8872106B2Oct 28, 2014

Pattern measuring apparatus

HITACHI HIGH TECH CORP3 citations60
US7684937B2Mar 23, 2010

Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication

HITACHI HIGH TECH CORP0 citations52
US9000366B2Apr 7, 2015

Method and apparatus for measuring displacement between patterns and scanning electron microscope installing unit for measuring displacement between patterns

HITACHI HIGH TECH CORP0 citations42

HITACHI LTD

9 patents

YAZAKI CORP

9 patents

MATSUI SHIKISO KAGAKU KOGYOSHO

2 patents

SUMITOMO WIRING SYSTEMS

2 patents

MAEDA TATSUYA

2 patents

MORESCO CORP

2 patents

KOMATSU MFG CO LTD

1 patent

IKEDA MITSUJI

1 patent

NEC CORP

1 patent

YAMAGUCHI SATORU

1 patent

OOSAKI MAYUKA

1 patent

KAKUTA JUNICHI

1 patent

SHISHIDO CHIE

1 patent

NEC ELECTRONICS CORP

1 patent