Inventor

HUI ANGELA

US47 patents

⚠️ This page may combine multiple inventors who share the name “HUI ANGELA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUI ANGELA

ADVANCED MICRO DEVICES INC

Methods for improving carrier mobility of PMOS and NMOS devices

Simplified dual damascene process for multi-level metallization and interconnection structure

Laser thermal annealing of silicon nitride for increased density and etch selectivity

Formation of STI (shallow trench isolation) structures within core and periphery areas of flash memory device

Process for fabricating an integrated circuit with a self-aligned contact

Method of forming a local interconnect with improved etch selectivity of silicon dioxide/silicide

Structure and method for preventing UV radiation damage and increasing data retention in memory cells

RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist

Method of manufacturing spacer etch mask for silicon-oxide-nitride-oxide-silicon (SONOS) type nonvolatile memory

Method of forming a sidewall spacer to prevent gouging of device junctions during interlayer dielectric etching including silicide growth over gate spacers

Shallow trench isolation formation to eliminate poly stringer with controlled step height and corner rounding

Method to improve LDD corner control with an in-situ film for local interconnect processing

Process for making a dual bit memory device with isolated polysilicon floating gates

Method and system for providing a contact hole in a semiconductor device

Dual bit memory device with isolated polysilicon floating gates

Process for fabricating an integrated circuit with a self-aligned contact

Method for minimizing nitride residue on a silicon wafer

Undoped oxide liner/BPSG for improved data retention

SPANSION LLC

Structure and method for preventing UV radiation damage in a memory cell and improving contact CD control

Structure and method for preventing process-induced UV radiation damage in a memory cell

Self-aligned patterning method by using non-conformal film and etch for flash memory and other semiconductor applications

Ultraviolet radiation blocking interlayer dielectric

Methods for fabricating flash memory devices

Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications

Selective silicide formation using resist etchback

Method and system for forming dual gate structures in a nonvolatile memory using a protective layer

SI trench between bitline HDP for BVDSS improvement

Selective contact formation using masking and resist patterning techniques

Methods for forming a memory cell having a top oxide spacer

ORO and ORPRO with bit line trench to suppress transport program disturb

Flash memory device and method of forming the same with improved gate breakdown and endurance

Use of a polymer spacer and Si trench in a bitline junction of a flash memory cell to improve TPD characteristics

Use of a polymer spacer and Si trench in a bitline junction of a flash memory cell to improve TPD characteristics

Dual storage node memory devices and methods for fabricating the same

CHENG NING

HTO offset for long Leffective, better device performance

Oro and orpro with bit line trench to suppress transport program disturb

CYPRESS SEMICONDUCTOR CORP

HTO offset for long leffective, better device performance

Split-gate semiconductor device with L-shaped gate

KINOSHITA HIROYUKI

Etch stop layer for memory cell reliability improvement

Etch stop layer for memory cell reliability improvement

FANG SHENQING

Self-aligned SI rich nitride charge trap layer isolation for charge trap flash memory

Methods for forming a memory cell having a top oxide spacer

FASL LLC

Innovative method of hard mask removal

(unassigned)

Highly selective high aspect ratio oxide etch method and products made by the process

FASL LLP

Method for fabricating a memory device having reverse LDD

HUI ANGELA

Flash memory device and method of forming the same with improved gate breakdown and endurance

MIN KYUNGHOON

Selective silicide formation using resist etch back