Inventor
AMIKURA NORIHIKO
JP48 patents
⚠️ This page may combine multiple inventors who share the name “AMIKURA NORIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
42 patentsUSD494552SAug 17, 2004
Exhaust ring for manufacturing semiconductors
TOKYO ELECTRON LTD432 citations98
US6986261B2Jan 17, 2006
Method and system for controlling chiller and semiconductor processing system
TOKYO ELECTRON LTD22 citations92
US11742188B2Aug 29, 2023
Substrate processing method, pressure control apparatus and substrate processing system
TOKYO ELECTRON LTD4 citations74
US11862506B2Jan 2, 2024
Substrate processing system, vacuum substrate transfer module, and substrate transfer method
TOKYO ELECTRON LTD3 citations73
US10229844B2Mar 12, 2019
Gas supply system, gas supply control method and gas replacement method
TOKYO ELECTRON LTD3 citations71
US10871786B2Dec 22, 2020
Substrate processing system and method of determining flow rate of gas
TOKYO ELECTRON LTD2 citations69
US8043659B2Oct 25, 2011
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations63
US11698648B2Jul 11, 2023
Gas supply system and gas supply method
TOKYO ELECTRON LTD0 citations62
US11538665B2Dec 27, 2022
Gas supply system, substrate processing apparatus, and control method for gas supply system
TOKYO ELECTRON LTD1 citations62
US10996688B2May 4, 2021
Gas supply system and gas supply method
TOKYO ELECTRON LTD0 citations62
US10876870B2Dec 29, 2020
Method of determining flow rate of a gas in a substrate processing system
TOKYO ELECTRON LTD1 citations62
US10533916B2Jan 14, 2020
Method for inspecting for leaks in gas supply system valves
TOKYO ELECTRON LTD1 citations62
US12557585B2Feb 17, 2026
Processing system and transfer method
TOKYO ELECTRON LTD0 citations61
US12341046B2Jun 24, 2025
Transfer apparatus and transfer method
TOKYO ELECTRON LTD0 citations61
US12191188B2Jan 7, 2025
Transfer device, transfer system, and end effector
TOKYO ELECTRON LTD1 citations61
US12125738B2Oct 22, 2024
Storage module, substrate processing system, and method of transferring consumable member
TOKYO ELECTRON LTD0 citations61
US11994234B2May 28, 2024
Gate valve and driving method
TOKYO ELECTRON LTD1 citations61
US11955356B2Apr 9, 2024
Processing system and transfer method
TOKYO ELECTRON LTD0 citations61
US11705355B2Jul 18, 2023
Substrate transfer system and atmospheric transfer module
TOKYO ELECTRON LTD0 citations61
US11227785B2Jan 18, 2022
Substrate transfer system and atmospheric transfer module
TOKYO ELECTRON LTD0 citations61
US10168049B2Jan 1, 2019
Method for preventing explosion of exhaust gas in decompression processing apparatus
TOKYO ELECTRON LTD1 citations61
US10665430B2May 26, 2020
Gas supply system, substrate processing system and gas supply method
TOKYO ELECTRON LTD1 citations60
US12264947B2Apr 1, 2025
Measuring system, measuring device, and measuring method
TOKYO ELECTRON LTD0 citations58
US12040202B2Jul 16, 2024
Processing system
TOKYO ELECTRON LTD0 citations52
US12046454B2Jul 23, 2024
Performance calculation method and processing apparatus
TOKYO ELECTRON LTD0 citations51
US11513541B2Nov 29, 2022
Method of inspecting and inspection apparatus
TOKYO ELECTRON LTD0 citations51
US11231313B2Jan 25, 2022
Method of obtaining output flow rate of flow rate controller and method of processing workpiece
TOKYO ELECTRON LTD0 citations51
US10424466B2Sep 24, 2019
Method for inspecting shower plate of plasma processing apparatus
TOKYO ELECTRON LTD0 citations51
US9240307B2Jan 19, 2016
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US12285786B2Apr 29, 2025
Substrate processing apparatus, purge gas control method, and vacuum transfer chamber cleaning method
TOKYO ELECTRON LTD0 citations50
US12165893B2Dec 10, 2024
Substrate processing system and transfer method
TOKYO ELECTRON LTD0 citations50
US12131937B2Oct 29, 2024
Transfer system, transfer device, and transfer method
TOKYO ELECTRON LTD0 citations50
US11791180B2Oct 17, 2023
Substrate transfer system and load lock module
TOKYO ELECTRON LTD0 citations50
US11326914B2May 10, 2022
Flow rate measurement apparatus and method for more accurately measuring gas flow to a substrate processing system
TOKYO ELECTRON LTD0 citations50
US11644121B2May 9, 2023
Gas inspection method, substrate processing method, and substrate processing system
TOKYO ELECTRON LTD0 citations49
US11585717B2Feb 21, 2023
Method for calibrating plurality of chamber pressure sensors and substrate processing system
TOKYO ELECTRON LTD0 citations47
US10845119B2Nov 24, 2020
Method of arranging treatment process
TOKYO ELECTRON LTD0 citations41
US10788356B2Sep 29, 2020
Method of inspecting gas supply system, method of calibrating flow controller, and method of calibrating secondary reference device
TOKYO ELECTRON LTD0 citations40
US10274972B2Apr 30, 2019
Method of inspecting gas supply system
TOKYO ELECTRON LTD0 citations40
US10031007B2Jul 24, 2018
Method of calculating output flow rate of flow rate controller
TOKYO ELECTRON LTD0 citations40
US10859426B2Dec 8, 2020
Method of inspecting flow rate measuring system
TOKYO ELECTRON LTD0 citations39
US9904299B2Feb 27, 2018
Gas supply control method
TOKYO ELECTRON LTD0 citations39
AMIKURA NORIHIKO
4 patentsUS9103366B2Aug 11, 2015
Bolt-locking apparatus, mounting method thereof and mounting jig
AMIKURA NORIHIKO4 citations71
US9835195B2Dec 5, 2017
Bolt-locking apparatus, mounting method thereof and mounting jig
AMIKURA NORIHIKO1 citations61
US9494180B2Nov 15, 2016
Bolt-locking apparatus, mounting method thereof and mounting jig
AMIKURA NORIHIKO0 citations51
US8597401B2Dec 3, 2013
Exhausting method and gas processing apparatus
AMIKURA NORIHIKO0 citations39