P

Inventor

DUANE MICHAEL

US38 patents
⚠️ This page may combine multiple inventors who share the name “DUANE MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

21 patents
US5949092ASep 7, 1999

Ultra-high-density pass gate using dual stacked transistors having a gate structure with planarized upper surface in relation to interlayer insulator

ADVANCED MICRO DEVICES INC62 citations96
US6027978AFeb 22, 2000

Method of making an IGFET with a non-uniform lateral doping profile in the channel region

ADVANCED MICRO DEVICES INC40 citations93
US6027964AFeb 22, 2000

Method of making an IGFET with a selectively doped gate in combination with a protected resistor

ADVANCED MICRO DEVICES INC24 citations93
US6004849ADec 21, 1999

Method of making an asymmetrical IGFET with a silicide contact on the drain without a silicide contact on the source

ADVANCED MICRO DEVICES INC28 citations93
US5898189AApr 27, 1999

Integrated circuit including an oxide-isolated localized substrate and a standard silicon substrate and fabrication method

ADVANCED MICRO DEVICES INC22 citations93
US5888853AMar 30, 1999

Integrated circuit including a graded grain structure for enhanced transistor formation and fabrication method thereof

ADVANCED MICRO DEVICES INC35 citations93
US6091118AJul 18, 2000

Semiconductor device having reduced overlap capacitance and method of manufacture thereof

ADVANCED MICRO DEVICES INC25 citations92
US5804496ASep 8, 1998

Semiconductor device having reduced overlap capacitance and method of manufacture thereof

ADVANCED MICRO DEVICES INC34 citations92
US6030875AFeb 29, 2000

Method for making semiconductor device having nitrogen-rich active region-channel interface

ADVANCED MICRO DEVICES INC17 citations84
US6008096ADec 28, 1999

Ultra short transistor fabrication method

ADVANCED MICRO DEVICES INC17 citations84
US5940707AAug 17, 1999

Vertically integrated advanced transistor formation

ADVANCED MICRO DEVICES INC17 citations84
US5693547ADec 2, 1997

Method of making vertical MOSFET with sub-trench source contact

ADVANCED MICRO DEVICES INC19 citations84
US6420730B1Jul 16, 2002

Elevated transistor fabrication technique

ADVANCED MICRO DEVICES INC7 citations74
US6075258AJun 13, 2000

Elevated transistor fabrication technique

ADVANCED MICRO DEVICES INC12 citations74
US5963809AOct 5, 1999

Asymmetrical MOSFET with gate pattern after source/drain formation

ADVANCED MICRO DEVICES INC14 citations74
US5872038AFeb 16, 1999

Semiconductor device having an elevated active region formed in an oxide trench and method of manufacture thereof

ADVANCED MICRO DEVICES INC7 citations74
US5834350ANov 10, 1998

Elevated transistor fabrication technique

ADVANCED MICRO DEVICES INC10 citations74
US6104064AAug 15, 2000

Asymmetrical transistor structure

ADVANCED MICRO DEVICES INC5 citations73
US5885761AMar 23, 1999

Semiconductor device having an elevated active region formed from a thick polysilicon layer and method of manufacture thereof

ADVANCED MICRO DEVICES INC5 citations63
US6104069AAug 15, 2000

Semiconductor device having an elevated active region formed in an oxide trench

ADVANCED MICRO DEVICES INC1 citations52
US5970349AOct 19, 1999

Semiconductor device having one or more asymmetric background dopant regions and method of manufacture thereof

ADVANCED MICRO DEVICES INC1 citations52

MIE FUJITSU SEMICONDUCTOR LTD

7 patents

BLOCK INC

5 patents

THOMPSON SCOTT E

2 patents

SUVOLTA INC

1 patent

SCUDDER LANCE

1 patent

SQUARE INC

1 patent