P

Inventor

CHO MYOUNG-KWAN

KR16 patents
⚠️ This page may combine multiple inventors who share the name “CHO MYOUNG-KWAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

12 patents
US5789293AAug 4, 1998

Nonvolatile memory device and manufacturing method thereof

SAMSUNG ELECTRONICS CO LTD102 citations97
US5912488AJun 15, 1999

Stacked-gate flash EEPROM memory devices having mid-channel injection characteristics for high speed programming

SAMSUNG ELECTRONICS CO LTD104 citations96
US6847556B2Jan 25, 2005

Method for operating NOR type flash memory device including SONOS cells

SAMSUNG ELECTRONICS CO LTD45 citations92
US5712178AJan 27, 1998

Non-volatile semiconductor memory device and method for manufacturing the same

SAMSUNG ELECTRONICS CO LTD42 citations92
US5514889AMay 7, 1996

Non-volatile semiconductor memory device and method for manufacturing the same

SAMSUNG ELECTRONICS CO LTD95 citations91
US7315055B2Jan 1, 2008

Silicon-oxide-nitride-oxide-silicon (SONOS) memory devices having recessed channels

SAMSUNG ELECTRONICS CO LTD18 citations84
US7547943B2Jun 16, 2009

Non-volatile memory devices that include a selection transistor having a recessed channel and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD15 citations83
US6544845B2Apr 8, 2003

Methods of fabricating nonvolatile memory devices including bird's beak oxide

SAMSUNG ELECTRONICS CO LTD17 citations82
US6144064ANov 7, 2000

Split-gate EEPROM device having floating gate with double polysilicon layer

SAMSUNG ELECTRONICS CO LTD15 citations73
US7034365B2Apr 25, 2006

Integrated circuit devices having contact holes exposing gate electrodes in active regions

SAMSUNG ELECTRONICS CO LTD9 citations71
US5888871AMar 30, 1999

Methods of forming EEPROM memory cells having uniformly thick tunnelling oxide layers

SAMSUNG ELECTRONICS CO LTD5 citations62
US7320909B2Jan 22, 2008

Methods of fabricating integrated circuit devices having contact holes exposing gate electrodes in active regions

SAMSUNG ELECTRONICS CO LTD2 citations60

SK HYNIX INC

4 patents