Inventor
FIOLKA DAMIAN
DE81 patents
⚠️ This page may combine multiple inventors who share the name “FIOLKA DAMIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
18 patentsUS8035803B2Oct 11, 2011
Subsystem of an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH10 citations84
US7995280B2Aug 9, 2011
Projection exposure system, beam delivery system and method of generating a beam of light
ZEISS CARL SMT GMBH14 citations80
US10151982B2Dec 11, 2018
Illumination system of a microlithographic projection exposure apparatus with a birefringent element
ZEISS CARL SMT GMBH2 citations71
US8711479B2Apr 29, 2014
Illumination apparatus for microlithography projection system including polarization-modulating optical element
ZEISS CARL SMT GMBH1 citations63
US8040492B2Oct 18, 2011
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH3 citations63
US8025427B2Sep 27, 2011
Filter device for the compensation of an asymmetric pupil illumination
ZEISS CARL SMT GMBH2 citations63
US8004656B2Aug 23, 2011
Illumination system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH5 citations63
US7940375B2May 10, 2011
Transmission filter apparatus
ZEISS CARL SMT GMBH3 citations63
US7916391B2Mar 29, 2011
Apparatus for providing a pattern of polarization
ZEISS CARL SMT GMBH3 citations63
US9897925B2Feb 20, 2018
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9454085B2Sep 27, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9239229B2Jan 19, 2016
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9170499B2Oct 27, 2015
Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element
ZEISS CARL SMT GMBH1 citations62
US9091945B2Jul 28, 2015
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH3 citations62
US10146135B2Dec 4, 2018
Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
ZEISS CARL SMT GMBH0 citations52
US9933706B2Apr 3, 2018
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9778576B2Oct 3, 2017
Microlithography illumination system and microlithography illumination optical unit
ZEISS CARL SMT GMBH1 citations52
US9588435B2Mar 7, 2017
EUV microlithography projection exposure apparatus with a heat light source
ZEISS CARL SMT GMBH1 citations52
FIOLKA DAMIAN
13 patentsUS8279524B2Oct 2, 2012
Polarization-modulating optical element
FIOLKA DAMIAN33 citations96
US8320043B2Nov 27, 2012
Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
FIOLKA DAMIAN21 citations93
US8289623B2Oct 16, 2012
Polarization-modulating optical element
FIOLKA DAMIAN19 citations93
US8270077B2Sep 18, 2012
Polarization-modulating optical element
FIOLKA DAMIAN20 citations93
US8259393B2Sep 4, 2012
Polarization-modulating optical element
FIOLKA DAMIAN34 citations93
US8482717B2Jul 9, 2013
Polarization-modulating optical element
FIOLKA DAMIAN11 citations84
US8077289B2Dec 13, 2011
Device and method for influencing the polarization distribution in an optical system
FIOLKA DAMIAN7 citations84
US8587767B2Nov 19, 2013
Illumination optics for EUV microlithography and related system and apparatus
FIOLKA DAMIAN12 citations82
US8264668B2Sep 11, 2012
Illumination system of a microlithographic projection exposure apparatus
FIOLKA DAMIAN5 citations73
US9304405B2Apr 5, 2016
Microlithography illumination system and microlithography illumination optical unit
FIOLKA DAMIAN5 citations72
US8542356B2Sep 24, 2013
Measurement method and measurement system for measuring birefringence
FIOLKA DAMIAN5 citations65
US9013680B2Apr 21, 2015
Illumination system of a microlithographic projection exposure apparatus
FIOLKA DAMIAN2 citations62
US8928859B2Jan 6, 2015
Illumination system of a microlithographic projection exposure apparatus
FIOLKA DAMIAN2 citations62
ZEISS CARL SMT AG
8 patentsUS7511886B2Mar 31, 2009
Optical beam transformation system and illumination system comprising an optical beam transformation system
ZEISS CARL SMT AG63 citations98
US7408616B2Aug 5, 2008
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG70 citations97
US7551261B2Jun 23, 2009
Illumination system for a microlithography projection exposure installation
ZEISS CARL SMT AG24 citations93
US7847921B2Dec 7, 2010
Microlithographic exposure method as well as a projection exposure system for carrying out the method
ZEISS CARL SMT AG30 citations92
US7714983B2May 11, 2010
Illumination system for a microlithography projection exposure installation
ZEISS CARL SMT AG38 citations92
US7408622B2Aug 5, 2008
Illumination system and polarizer for a microlithographic projection exposure apparatus
ZEISS CARL SMT AG27 citations92
US7782443B2Aug 24, 2010
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT AG5 citations73
US7798676B2Sep 21, 2010
Filter device for the compensation of an asymmetric pupil illumination
ZEISS CARL SMT AG2 citations63
ASML NETHERLANDS BV
2 patentsXALTER STEFAN
2 patentsUS9013684B2Apr 21, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN17 citations91
US8339577B2Dec 25, 2012
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN9 citations82
LAYH MICHAEL
2 patentsTOTZECK MICHAEL
1 patentSCHUSTER KARL-HEINZ
1 patentMAUL MANFRED
1 patentSAENGER INGO
1 patentKIRCH MARC
1 patentShowing the top 50 of 81 patents by PatentIndex Score.