Inventor
MAUL MANFRED
DE66 patents
⚠️ This page may combine multiple inventors who share the name “MAUL MANFRED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
20 patentsUS8811568B2Aug 19, 2014
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH5 citations84
US9280060B2Mar 8, 2016
Illumination system for microlithography
ZEISS CARL SMT GMBH5 citations82
US7995280B2Aug 9, 2011
Projection exposure system, beam delivery system and method of generating a beam of light
ZEISS CARL SMT GMBH14 citations80
US9964856B2May 8, 2018
Illumination optical unit for projection lithography
ZEISS CARL SMT GMBH2 citations73
US10444631B2Oct 15, 2019
Method of operating a microlithographic projection apparatus and illumination system of such an apparatus
ZEISS CARL SMT GMBH2 citations72
US9955563B2Apr 24, 2018
EUV light source for generating a usable output beam for a projection exposure apparatus
ZEISS CARL SMT GMBH2 citations72
US8025427B2Sep 27, 2011
Filter device for the compensation of an asymmetric pupil illumination
ZEISS CARL SMT GMBH2 citations63
US8004656B2Aug 23, 2011
Illumination system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH5 citations63
US9897925B2Feb 20, 2018
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9239229B2Jan 19, 2016
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9170499B2Oct 27, 2015
Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element
ZEISS CARL SMT GMBH1 citations62
US9606441B2Mar 28, 2017
Illumination system for microlithography
ZEISS CARL SMT GMBH1 citations61
US9217930B2Dec 22, 2015
Illumination system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations60
US10146135B2Dec 4, 2018
Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
ZEISS CARL SMT GMBH0 citations52
US10054786B2Aug 21, 2018
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH0 citations52
US9766553B2Sep 19, 2017
Illumination optical unit for projection lithography
ZEISS CARL SMT GMBH1 citations52
US9720327B2Aug 1, 2017
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9366857B2Jun 14, 2016
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH0 citations52
US9019475B2Apr 28, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9001309B2Apr 7, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
ZEISS CARL SMT AG
12 patentsUS7511886B2Mar 31, 2009
Optical beam transformation system and illumination system comprising an optical beam transformation system
ZEISS CARL SMT AG63 citations98
US7145720B2Dec 5, 2006
Objective with fluoride crystal lenses
ZEISS CARL SMT AG49 citations95
US7714983B2May 11, 2010
Illumination system for a microlithography projection exposure installation
ZEISS CARL SMT AG38 citations92
US7408622B2Aug 5, 2008
Illumination system and polarizer for a microlithographic projection exposure apparatus
ZEISS CARL SMT AG27 citations92
US7233386B2Jun 19, 2007
Method of optimizing imaging performance
ZEISS CARL SMT AG16 citations92
US6879379B2Apr 12, 2005
Projection lens and microlithographic projection exposure apparatus
ZEISS CARL SMT AG27 citations92
US7875865B2Jan 25, 2011
EUV illumination system with a system for measuring fluctuations of the light source
ZEISS CARL SMT AG9 citations82
US7570345B2Aug 4, 2009
Method of optimizing imaging performance
ZEISS CARL SMT AG7 citations73
US7180667B2Feb 20, 2007
Objective with fluoride crystal lenses
ZEISS CARL SMT AG4 citations73
US7798676B2Sep 21, 2010
Filter device for the compensation of an asymmetric pupil illumination
ZEISS CARL SMT AG2 citations63
US7031069B2Apr 18, 2006
Microlithographic illumination method and a projection lens for carrying out the method
ZEISS CARL SMT AG5 citations63
US7126765B2Oct 24, 2006
Objective with fluoride crystal lenses
ZEISS CARL SMT AG3 citations62
FIOLKA DAMIAN
3 patentsUS8264668B2Sep 11, 2012
Illumination system of a microlithographic projection exposure apparatus
FIOLKA DAMIAN5 citations73
US8928859B2Jan 6, 2015
Illumination system of a microlithographic projection exposure apparatus
FIOLKA DAMIAN2 citations62
US8730455B2May 20, 2014
Illumination system for a microlithographic projection exposure apparatus
FIOLKA DAMIAN0 citations52
XALTER STEFAN
2 patentsUS9013684B2Apr 21, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN17 citations91
US8339577B2Dec 25, 2012
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN9 citations82
SCHOLZ AXEL
2 patentsHELL AG LINOTYPE
2 patentsLAYH MICHAEL
2 patentsZEISS STIFTUNG
1 patentZEISS CARL SEMICONDUCTOR MFG
1 patentSCHUSTER KARL-HEINZ
1 patentBLEIDISTEL SASCHA
1 patentMAUL MANFRED
1 patentWANGLER JOHANNES
1 patentCARL ZEISS SMART OPTICS GMBH
1 patentShowing the top 50 of 66 patents by PatentIndex Score.